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International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan

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1.Development of optical computerized tomography in capacitively coupled plasmas and inductively coupled plasmas for plasma etching

机译：在电容耦合等离子体和电感耦合等离子体中用于等离子体蚀刻的光学计算机层析成像技术的发展
- 作者：T. Makabe;Z.Lj. Petrovic
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- computerised tomography (CT);
- CCP;
- ICP;
- OES-CT;
- OAS-CT;
- rf plasma for etching;
2.Development of high-density plasma reactor for high-performance processing and future prospects

机译：用于高性能处理的高密度等离子体反应器的开发及未来前景
- 作者：Seiji Samukawa
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
3.Dielectric film etching in semiconductor device manufacturing Development of SiO_2 etching and the next generation plasma reactor

机译：半导体器件制造中的介电膜蚀刻SiO_2蚀刻和下一代等离子体反应器的开发
- 作者：Makoto Sekine
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
4.Database in low temperature plasma modeling

机译：低温等离子体建模数据库
- 作者：Y. Sakai
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- database;
- electron collision;
- plasma modeling;
5.Modeling of magnetron sputtering plasmas

机译：磁控溅射等离子体建模
- 作者：C.H. Shon;J.K. Lee
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- low-temperature plasma;
- magnetron sputter;
- kinetic simulation;
- particle-in-cell;
- monte carlo;
6.Kinetic phenomena in electron transport in radio-frequency fields

机译：射频场中电子传输的动力学现象
- 作者：Z.Lj. Petrovic;Z.M. Raspopovic;S. Dujko;T. Makabe
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- kinetic phenomena;
- radio-frequency;
- electron;
7.Recent progress in the understanding of electron kinetics in low-pressure inductive plasmas

机译：低压感应等离子体中电子动力学理解的最新进展
- 作者：U. Kortshagen;A. Maresca;K. Orlov;B. Heil
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- nonlocal electron kinetics;
- low-pressure inductive plasma;
- electron fluxes;
- diffusive electron cooling;
8.Measurement techniques of radicals, their gas phase and surface reactions in reactive plasma processing

机译：反应性等离子体处理中自由基，它们的气相和表面反应的测量技术
- 作者：Masaru Hori;Toshio Goto
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- radical;
- measurement;
- plasma;
- process;
- reaction;
9.Temporal and spatial relaxation of electrons in low temperature plasmas

机译：低温等离子体中电子的时空弛豫
- 作者：R. Winkler;D. Loffhagen;F. Sigeneger
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- temporal relaxation;
- spatial relaxation;
- kinetic equation;
- energy distribution;
- relaxation time;
- relaxation length;
10.Spatially resolved CF, CF_2, SiF and SiF_2 densities in fluorocarbon containing inductively driven discharges

机译：含碳的感应驱动放电中空间分辨的CF，CF_2，SiF和SiF_2密度
- 作者：G.A. Hebner
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- plasma;
- inductive;
- laser;
- optical;
- fluorescence;
- fluorocarbon;
- discharge;
11.Electron interactions with plasma processing gases: present status and future needs

机译：电子与等离子体处理气体的相互作用：现状和未来需求
- 作者：Loucas G. Christophorou;James K. Olthoff
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- cross sections;
- database;
- data needs;
- electron interactions;
- plasma processing gases;
- transport coefficients;
12.Application and simulation of low temperature plasma processes in semiconductor manufacturing

机译：低温等离子体工艺在半导体制造中的应用与仿真
- 作者：P.L.G. Ventzek;S. Rauf;P.J. Stout;D. Zhang;W. Dauksher;E. Hall
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- plasma;
- semiconductor;
- simulation;
13.Development of swarm transport theory in radio-frequency electric and crossed electric and magnetic fields

机译：射频电场和交叉电场与磁场中群迁移理论的发展
- 作者：R.D. White;K.F. Ness;R.E. Robson
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- boltzmann equation;
- electron swarms;
- ion swarms;
- plasma discharge modelling;
14.Vertically integrated computer-aided design for device processing

机译：垂直集成的计算机辅助设计，用于设备处理
- 作者：Toshiaki Makabe;Kazunobu Maeshige
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
15.Negative ions in processing plasmas and their effect on the plasma structure

机译：处理等离子体中的负离子及其对等离子体结构的影响
- 作者：Akihiro Kono
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- negative ion;
- electronegative plasma;
- photodetachment;
- ambipolar diffusion;
- sheath;
16.Surface chemistry associated with plasma etching processes

机译：与等离子体蚀刻工艺相关的表面化学
- 作者：David B. Graves;David Humbird
- 会议名称：《》 | 2001年
- surface chemistry;
- plasma etching;
- silicon;
- molecular-dynamics;
- ion-bombardment;
17.Efficiency of AC plasma display panels from diagnostics and models

机译：诊断和模型对AC等离子显示屏的效率
- 作者：R. Ganter;Th. Callegari;L.C. Pitchford;J.P. Boeuf
- 会议名称：《International Workshop on Basis for Low Temperature Plasma Applications Jul 24-25, 2001 Hakone in Japan》 | 2001年
- plasma display panels;
- rfficiency;
- xenon excitation;
- glow discharge;
- discharge modeling;
- UV photon generation;
- RF diseharges;