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Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays

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1.Application of off-specular x-ray reflectivity for surfacecharacterization,

机译：非镜面x射线反射率在表面表征中的应用
- 作者：Wen-li Wu;National Institute of Standards;Technology;Gaithersburg;MD;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
2.Instrument for measuring flatness by using laser and CCD

机译：用激光和CCD测量平面度的仪器
- 作者：Qun Hao;Tsinghua Univ.;Beijing;China;Mang Cao;Tsinghua Univ.;Beijing;China;Dacheng Li;Tsinghua Univ.;Beijing;China.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
3.Flatness measurement by reflection moire technique

机译：反射云纹技术测量平面度
- 作者：Hisatoshi Fujiwara;Yamatake-Honeywell Inc.;Fujisawa;Kanagawa;Japan;Yukitoshi Otani;Tokyo Univ. of Agriculture;Technology;Koganei-shi;Tokyo;Japan;Toru Yoshizawa;Tokyo Univ. of Agriculture;Technology;Koganei;Tokyo;Japan.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
4.Confocal microscope 3D visualizing method for fine surface characterization of microstructures

机译：共聚焦显微镜的3D可视化方法，用于微结构的精细表面表征
- 作者：Yoshiharu Ichikawa;Texas Instruments Japan Ltd.;Inashiki Ibaraki;Japan;Jun-Ichiro Toriwaki;Nagoya Univ.;Nagoya;Japan.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
5.Fast and accurate roughness characterization techniques for wafers and hard disks

机译：快速准确的晶圆和硬盘粗糙度表征技术
- 作者：Hendrik Rothe;Federal Armed Forces Univ.;Hamburg;Germany;Andre Kasper;Federal Armed Forces Univ.;Hamburg;Germany.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
6.New method of surface characterization with a single-mode fiber to thin film coupler

机译：单模光纤至薄膜耦合器的表面表征新方法
- 作者：Alok K. Das;Jadavpur Univ.;Calcutta;India;Amar K. Ganguly;Jadavpur Univ.;Calcutta;India;Anawar Hussain;Jadavpur Univ.;Calcutta;India;Shila Ghosh;Jadavpur Univ.;Calcutta;India;Bharat S. Choudhury;Jadavpur Univ.;Calcutta;India.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
7.Proposed methodology for characterization of microroughness-induced optical scatter instrumentation

机译：拟议的表征微粗糙度引起的光散射仪器的方法
- 作者：Thomas A. Germer;National Institute of Standards;Technology;Gaithersburg;MD;USA;Clara C. Asmail;National Institute of Standards;Technology;Gaithersburg;MD;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
8.Silicon wafer specifications and characterization capabilities: another perspective

机译：硅晶片规格和表征能力：另一个角度
- 作者：Randal K. Goodall;SEMATECH;Austin;TX;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
9.Comparison of experimentally measured differential scattering cross sections of PSL spheres on flat surfaces and patterned surfaces

机译：在平面和带图案的表面上实验测量的PSL球的微分散射截面的比较
- 作者：Greg W. Starr;Arizona State Univ.;Tempe;AZ;USA;Edwin Dan Hirleman;Arizona State Univ.;Tempe;AZ;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
10.Large flat panel profiler

机译：大型平板轮廓仪
- 作者：Klaus R. Freischlad;Phase Shift Technology;Tucson;AZ;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
11.Method to improve the accuracy of super-smooth surface scatter data

机译：一种提高超光滑表面散射数据精度的方法
- 作者：Yoshitate Takakura;Univ. Louis Pasteur;Illkirch;France;Mohamed T. Sehili;Univ. Louis Pasteur;Illkirch;France;Patrick Meyrueis;Univ. Louis Pasteur;Illkirch;France.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
12.Requirements and suggestions for an industrial smooth surface microroughness standards

机译：工业光滑表面微粗糙度标准的要求和建议
- 作者：John C. Stover;ADE Optical Systems;Charlotte;NC;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
13.Morphology of silicon wafer surfaces: a comparative study with atomic force microscopy and other techniques

机译：硅晶片表面形态：与原子力显微镜和其他技术的比较研究
- 作者：Peter Wagner;Wacker Siltronic GmbH;Burghausen;Germany;H.A. Gerber;Wacker Siltronic GmbH;Burghausen;Germany;D.Graef;Wacker Siltronic GmbH;Burghausen;Germany;R.Schmolke;Wacker Siltronic GmbH;Burghausen;Germany;M.Suhren;Wacker Siltronic GmbH;Burghausen;Germany.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
14.Utilization of near specular energy in the detection of surface defects

机译：利用近镜面能量检测表面缺陷
- 作者：Kevin Welch;ADE Optical Systems;Bozeman;MT;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
15.Application of off-specular x-ray reflectivity for surface characterization

机译：镜外X射线反射率在表面表征中的应用
- 作者：Author(s): Wen-li Wu National Institute of Standards and Technology Gaithersburg MD USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
16.Requirements of measurement equipment for silicon wafers

机译：硅片测量设备要求
- 作者：Peter Wagner;Wacker Siltronic AG;Burghausen;Germany;H.A. Gerber;Wacker Siltronic AG;Burghausen;Germany;R.Schmolke;Wacker Siltronic AG;Burghausen;Germany;R.Velten;Wacker Siltronic AG;Burghausen;Germany.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
17.Modeling of light scattering from structures with particle contaminants

机译：建模具有颗粒污染物的结构的光散射
- 作者：Brent M. Nebeker;Arizona State Univ.;Tempe;AZ;USA;Greg W. Starr;Arizona State Univ.;Tempe;AZ;USA;Edwin Dan Hirleman;Arizona State Univ.;Tempe;AZ;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
18.Development of a physical haze and microroughness standard

机译：制定物理雾度和微粗糙度标准
- 作者：Bradley W. Scheer;VLSI Standards;Inc.;San Jose;CA;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
19.Selection of calibration particles for scanning surface inspection systems

机译：选择用于扫描表面检查系统的校准颗粒
- 作者：George W. Mulholland;National Institute of Standards;Technology;Gaithersburg;MD;USA;Nelson Bryner;National Institute of Standards;Technology;Gaithersburg;MD;USA;Walter Liggett;National Institute of Standards;Technology;Gaithersburg;MD;USA;Bradley W. Scheer;VLSI Standards;Inc.;San Jose;CA;USA;Randal K. Goodall;SEMATECH;Austin;TX;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年
20.Surface haze in the Stokes-Mueller representation

机译：Stokes-Mueller表示中的表面雾度
- 作者：Eugene L. Church;ADE Optical Systems;Morristown;NJ;USA;John C. Stover;ADE Optical Systems;Charlotte;NC;USA.
- 会议名称：《Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays》 | 1996年