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Symposium on photomask and next-generation lithography mask technology

召开年：2018
召开地：Yokohama(JP)
出版时间：-

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1.Progress in Nanoimprint Wafer and Mask Systems for High Volume Semiconductor Manufacturing

机译：用于大规模半导体制造的纳米压印晶圆和掩模系统的进展
- 作者：Naoki Murasato;Tsuyoshi Arai
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- Nanoimprint Lithography;
- NIL;
- CoO;
- defectivity;
- throughput;
- overlay;
- image placement accuracy;
- mask replication;
2.Improved Particle Control for High Volume Semiconductor Manufacturing for Nanoimprint Lithography

机译：用于大体积半导体制造的纳米压印光刻技术的改进粒子控制
- 作者：Tsuyoshi Arai;Yoichi Matsuoka;Hisanobu Azutna
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- nanoimprint lithography;
- NIL;
- FPA-1200NZ2C;
- mask life;
- particle;
- defect;
3.Shin-Etsu super-high-flat substrate for FPD panel photomask

机译：用于FPD面板光掩模的信越超高平坦基材
- 作者：Youkou Ishitsuka;Daijitsu Harada;Atsushi Watabe;Masaki Takeuchi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- FPD photomask substrate;
- flatness;
- TTV;
4.New Half-Tone lithography uses for FPD proximity printing

机译：新的半色调光刻技术用于FPD邻近印刷
- 作者：Shuhei Kobayashi;Koichiro Yoshida;Masayuki Miyoshi;Yutaka Yoshikawa
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
5.Multi-beam mask writer MBM-1000

机译：多光束口罩书写器MBM-1000
- 作者：Hiroshi Matsumoto;Hideo Inoue;Hiroshi Yamashita;Takao Tamura;Kenji Ohtoshi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- multi beam;
- electron beam;
- blanking aperture array;
- throughput;
- shot count;
6.Dry etching technologies for Cr film

机译：Cr膜干法刻蚀技术
- 作者：Kei Hattori;Takashi Miyamoto;Yoshinori Iino;Shunpei Kodama;Yoshie Okamoto;Kazuki Nakazawa;Makoto Karyu;Hideaki Terakado;Hiroki Shirahama;Hirotsugu Ita;Tomoaki Yoshimori;Hidehito Azumano;Makoto Muto;Mumenori Iwami
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- Cr;
- Etch;
- Hard mask;
- Phase shift mask;
- CD;
7.Update on the performance of photomask repair and clean with DUV femtosecond laser processes

机译：使用DUV飞秒激光工艺更新光掩模修复和清洁的性能
- 作者：Tod Robinson;Jeff LeClaire
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- Photomask;
- repair;
- laser;
- Cr;
- MoSi;
- PSM;
- OMOG;
- EUV;
- SiN;
- NIL;
8.Demonstration of an Effective Mask Proximity Correction for Advanced Photomask

机译：演示了用于高级光掩模的有效掩模接近度校正
- 作者：Kenji Kono;Yasuo Kon;Yasunari Tsukino;Sergei Postnikov;Thiago Figueiro;Luc Martin;Paolo Petroni;Patrick Schiavone
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- photo mask;
- e-beam proximity effects;
- proximity effects correction;
- PEC;
- mask process correction;
- MPC;
- mask linearity;
9.Novel thermoplastic SOC materials for planarization use in multilayer lithography process

机译：多层光刻工艺中用于平面化的新型热塑性SOC材料
- 作者：Keisuke Kawashima;Koji Inoue;Takashi Oda;Kazuo Kohmura
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- Thermoplastic polymer;
- Spin-on-Carbon material;
- Multilayer lithography process;
- Planarization;
- Insolubilization;
10.eBeam Initiative Surveys Report Greatly Increased Confidence in EUV and Mask Process Correction Requirements

机译：eBeam计划调查报告极大提高了对EUV和掩模工艺修正要求的信心
- 作者：Aki Fujimura;Jan Willis
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- mask industry;
- photomask;
- mask yield;
- mask data preparation;
- eBeam;
- multi-beam;
- EUV;
- MPC;
11.Minimizing 'Tone Reversal' during 19x nm Mask Inspection

机译：在19x nm掩模检查期间最大程度地减少“音调反转”
- 作者：Kazunori Seki;Karen Badger;Masashi Yonetani;Anka Birnstein;Jan Heumann;Takeshi Isogawa;Toshio Konishi;Yutaka Kodera
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- EUVL;
- Mask Inspection;
- Defect Sensitivity;
- Tone Reversal;
- Focus Optimization;
- Polarization Optimization;
12.EUV Capping Layer Integrity

机译：EUV封盖层完整性
- 作者：Pavel Nesladek;Jonas Schmidt;Thorsten Krome
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- EUV;
- Ru;
- Capping layer;
- Stability;
- Mask lifetime;
13.Fabrication of Ta based absorber EUV mask with SRAF

机译：用SRAF制造Ta基吸收体EUV掩模
- 作者：Keiko Morishita;Kosuke Takai;Kenji Masui;Takashi Kamo;Tsukasa Abe;Yasutaka Morikawa;Naoya Hayashi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- EUV lithography;
- EUV mask;
- Ta based absorber;
14.Blank Defect Coverage Budget For 16nm Half-Pitch Single EUV Exposure

机译：16nm半间距单EUV曝光的空白缺陷覆盖范围预算
- 作者：Rik Jonckheere;Takeshi Yamane;Yasutaka Morikawa;Takashi Kamo
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- EUV lithography;
- EUV mask;
- mask defects;
- ML-defects;
- phase defects;
- mitigation;
- pattern shift;
15.Development of closed-type EUV pellicle

机译：封闭型EUV防护膜的开发
- 作者：Yosuke Ono;Kazuo Kohmura;Atsushi Okubo;Daiki Taneichi;Hisako Ishikawa;Tsuneaki Biyajima
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- EUV pellicle;
- EUV mask infrastructure;
- ventilation;
- adhesive;
- outgas;
- haze;
- carbon contamination;
16.Advanced ceramic protective lifetime prolong for particle control

机译：先进的陶瓷保护寿命可延长颗粒控制
- 作者：Yuan Hsu;Yutaka Satou
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- Defect;
- Plasma;
- Ceramic;
17.Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution

机译：场内遮罩到遮罩的重叠，将遮罩书写与动态防尘薄膜分离
- 作者：Richard van Haren;Steffen Steinert;Orion Mouraille;Koen Dhave;Leon van Dijk;Ronald Otten;Dirk Beyer
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- Registration Error;
- Overlay;
- Computational Overlay;
- Reticle;
- Mask;
- Pellicle;
- Feed-Forward;
- Multi Patterning;
18.Achieve High Hotspot Detection Accuracy by Pattern Scoring

机译：通过图案评分获得较高的热点检测精度
- 作者：Xiang Fang;Shou-Yuan Ma;Chien-Nan Lin;Hsu-Tang Liu;Chuan-Chun Lee;Chuen-Huei Yang;I-Y Chang;Erwin Deng;Ming-Feng Shen;Min-Ying Lu;Ling-Chieh Lin;Hung-Yueh Liao;Elven Huang;Jonathan Muirhead
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- Pattern matching;
- Weak pattern check;
- DFM;
- HTML report;
19.Enabling Accurate and Cost-Effective Registration Metrology on EUVL Masks

机译：在EUVL口罩上启用准确且具有成本效益的注册计量
- 作者：Runyuan Han;Hendrik Steigerwald;Frank Laske;Klaus-Dieter Roeth
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- LMS IPRO;
- metrology;
- registration;
- EUV;
- on-device overlay;
20.EUV Mask with Advanced Hybrid Black Border Suppressing EUV and DUV OOB Light Reflection

机译：具有高级混合黑色边框抑制EUV和DUV OOB光反射的EUV面罩
- 作者：Genta Watanabe;Norihito Fukugami;Toru Komizo;Yutaka Kodera;Toshio Konishi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
- EUV lithography;
- EUV mask;
- Black border;
- Out of band light;
- DUV light;
21.Exposure characteristics of ternary copolymerization positive tone electron beam resist containing p-chloro-α-methylstyrene

机译：含对氯-α-甲基苯乙烯的三元共聚合正电子束抗蚀剂的曝光特性
- 作者：Kenta Tatnaru;Shunsuke Ochiai;Yukiko Kishimura;Hironori Asada;Ryoichi Hoshino;Minako Iwakuma
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2018年
22.Quartz 9-inch size Mask Blanks for ArF PSM (Phase Shift Mask)

机译：用于ARF PSM的Quartz 9英寸尺寸掩模空白（相移掩模）
- 作者：Noriyuki Harashima;Tatsuya Isozaki;Arata Kawanishi;Shuichiro Kanai;Kagehiro Kageyama;Hiroyuki Iso;Tatsuya Chishima
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
23.Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

机译：具有高谐波发电EUV源相干EUV散射显微镜的EUVL掩模的观察
- 作者：Daiki Mamezaki;Tetsuo Harada;Yutaka Nagata;Takeo Watanabe
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- EUV lithography;
- EUV mask;
- coherent EUV scatterometry microscope;
- high-harmonic-generation;
- defect observation;
- Ptychography;
24.EUV modeling in the multi-beam mask writing era

机译：在多梁掩模写作时代的EUV建模
- 作者：Ryan Pearman;Harold Zable;Aki Fujimura
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- EUV;
- MPC;
- Multi-beam;
- PSF;
- modeling;
25.Exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene

机译：含P-氯-α-甲基苯乙烯的正音电子束抗蚀剂的曝光特性
- 作者：Shunsuke Ochiai;Tomohiro Takayama;Yukiko Kishimura;Hironori Asada;Manae Sonoda;Minako Iwakuma;Ryoichi Hoshino
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
26.Development of High Sensitivity and High Speed Large Size Blank Inspection System LBIS

机译：高灵敏度和高速大尺寸空白检测系统Lbis的开发
- 作者：Shinobu Ohara;Akinori Yoshida;Mitsuo Hirai;Takenori Kato;Koichi Moriizumi;Haruhiko Kusunose
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Large size blanks;
- blank inspection;
- laser scattering;
27.Shin-Etsu super-high-flat substrate for FPD panel photomask

机译：用于FPD面板Photomask的Shin-Etsu超高扁平基板
- 作者：Youkou Ishitsuka;Daijitsu Harada;Atsushi Watabe;Masaki Takeuchi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Flatness;
- FPD;
- Photomask;
28.Improved Particle Control for High Volume Semiconductor Manufacturing for Nanoimprint Lithography

机译：用于纳米压印光刻的高批量半导体制造的改进粒子控制
- 作者：Masami Yonekawa;Takahiro Nakayama;Kazuki Nakagawa;Toshihiro Maeda;Yoichi Matsuoka;Keiji Emoto;Hisanobu Azuma;Yukio Takabayashi;Ali Aghili;Makoto Mizuno;Jin Choi;Chris E. Jones
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- nanoimprint lithography;
- NIL;
- FPA-1200NZ2C;
- mask life;
- particle;
- defect;
29.First light and results on EBL2

机译：首先光和结果在EBL2上
- 作者：Norbert Koster;Edwin te Sligte;Alex Deutz;Freek Molkenboer;Pirn Muilwijk;Peter van der Walle;Wouter Mulckhuyse;Bjorn Nijland;Peter kerkhof;Michel van Putten
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- EUV exposure;
- mask;
- pellicle;
- XPS analysis;
- metrology;
- handling;
- contamination control;
30.How Smart is your BEOL? Productivity Improvement through Intelligent Automation

机译：你的beol有多聪明？通过智能自动化提高生产力
- 作者：Kristian Schulz;Kokila Egodage;Gilles Tabbone;Anthony Garetto
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- disposition;
- repair;
- inspection;
- automation;
- BEOL;
31.Multi-beam mask writer MBM-1000

机译：多梁面罩编写器MBM-1000
- 作者：Hiroshi Matsumoto;Hiroshi Yamashita;Takao Tamura;Kenji Ohtoshi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- multi beam;
- electron beam;
- blanking aperture array;
- throughput;
- shot count;
32.GPU: the Biggest Key Processor for AI and Parallel Processing

机译：GPU：AI和并行处理最大的关键处理器
- 作者：Toru Baji
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- GPU;
- SoC;
- CUDA;
- Moor's Law;
- Power;
- Die Size;
- Transistor Count;
- AI;
- Deep Learning;
- Autonomous Driving;
33.Simulation-Based MDP Verification for Leading-Edge Masks

机译：基于模拟的领先掩模MDP验证
- 作者：Bo Su;Oleg Syrel;Michael Pomerantsev;Kazuyuki Hagiwara;Ryan Pearman;Leo Pang;Aki Fujimura
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- MDP;
- TrueModel;
- GPU-acceleration;
- mask verification;
- mask simulation;
- etch bias;
34.MTO-like reference mask modeling for advanced inverse lithography technology patterns

机译：用于高级逆光刻技术模式的MTO的参考掩模建模
- 作者：Jongju Park;Jongin Moon;Suein Son;Donghoon Chung;Byung-Gook Kim;Chan-Uk Jeon;Patrick LoPresti;Shan Xue;Sonny Wang;Bill Broadbent;Soonho Kim;Jiuk Hur;Min Choo
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Photomask inspection;
- Pre-inspection data processing;
- OASIS;
- advanced ILT;
35.Cycle time Reduction by Html Report in Mask Checking Flow

机译：通过HTML报告在掩码中的循环时间减少
- 作者：Jian-Cheng Chen;Min-Ying Lu;Xiang Fang;Ming-Feng Shen;Shou-Yuan Ma;Chuen-Huei Yang;Joe Tsai;Rachel Lee;Erwin Deng;Ling-Chieh Lin;Hung-Yueh Liao;Jenny Tsai;Amanda Bowhill;Hien Vu;Gordon Russell
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Mask data preparation;
- mask rule check;
- mask data correctness check;
- html report;
36.Application of EUV dark field image for EUVL mask fabrication

机译：EUV暗场图像在EUVL面膜制造中的应用
- 作者：Takeshi Yamane;Hidehiro Watanabe
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- EUV;
- mask;
- phase defect;
- signal intensity;
- wafer CD;
- through focus;
37.Influence of the pellicle for FPD for i-line single wavelength exposure

机译：薄膜对FPD对I线单波长曝光的影响
- 作者：Kimiyuki Maruyama;Sadayuki Hirayama;Kohei Yano;Takashi Fujikawa;Masakatsu Hirano;Tatsunori Nakahara;Yuji Maruyama;Noriko Tani
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- FPD;
- pellicle;
- i-line;
- resolution;
- CD uniformity;
38.Accurate Lithography Simulation Model based on Convolutional Neural Networks

机译：基于卷积神经网络的精确光刻仿真模型
- 作者：Yuki Watanabe;Taiki Kimura;Tetsuaki Matsunawa;Shigeki Nojima
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Lithography simulation;
- Compact resist model;
- Deep learning;
- Convolutional neural networks;
39.EUV Repair process optimization and integration

机译：EUV修复过程优化和集成
- 作者：Pavel Nesladek;Alexander Lajn;Thorsten Schedel;Markus Bender
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- EUV;
- repair;
- mask lifetime;
- process interactions;
40.New PSM optimized for stable resolution of fine holes in FPD

机译：新的PSM优化了FPD中的细孔稳定分辨率
- 作者：Nobuhisa Imashiki;Yutaka Yoshikawa;Michihiko Hayase
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Photomasks for FPD;
- Photomasks with RET: PSM;
- Photomask-relating lithography technologies;
41.Model-Based MPC Enables Curvilinear ILT using Either VSB or Multi-Beam Mask Writers

机译：基于模型的MPC使使用VSB或多光束掩模编写器启用Curvilinear ILl
- 作者：Linyong Pang;Yutetsu Takatsukasa;Daisuke Hara;Michael Pomerantsev;Bo Su;Aki Fujimura
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Mask Process Correction (MPC);
- Model-based MPC;
- Mask writer;
- VSB;
- Multi-beam;
- Multi-beam mask writer;
- Inverse Lithography Technology (ILT);
- MPC;
- Mask simulation;
- Shot count;
- GPU;
42.Effects of Hard Mask Etch on Final Topography of Advanced Phase Shift Masks

机译：硬掩模蚀刻对高级相移掩模最终地形的影响
- 作者：Olga Hortenbach;Haiko Rolff;Alexander Lajn;Martin Baessler
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- PSM photomask;
- Cr etch;
- MoSi etch;
- phase angle uniformity;
- sidewall angle (SWA);
- reactive ion etch lag (RIE Lag);
- critical dimensions (CD);
43.Stabilize OMOG photomask post-repair CD variation by cleaning strategy and post-repair treatment

机译：通过清洁策略和修复后处理稳定修复CD变化的奥图焦点
- 作者：Vincent Shen;Josh Tzeng;Kuang Huang;Vic Chang
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- OMOG;
- repair;
- CD (Critical Dimension);
- cleaning;
- passivation;
- nitrogen composition;
44.Mask crosstalk defect between develop to etch process

机译：开发到蚀刻过程之间的掩模串扰缺陷
- 作者：Yuan Hsu;Hong-Jen Lee
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
45.Etch bias inversion during EUV mask ARC etch

机译：EUV掩模期间蚀刻偏置反转弧蚀刻
- 作者：Alexander Lajn;Haiko Rolff;Richard Wistrom
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- EUV photo mask;
- ARC etch;
- etch bias;
46.The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle X-ray scattering

机译：使用小角X射线散射测量纳米印刷模板中孔图案横截面轮廓的能力
- 作者：Kazuki Hagihara;Rikiya Taniguchi;Eiji Yamanaka;Kazuhiko Omote;Yoshiyasu Ito;Kiyoshi Ogata;Naoya Hayashi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- nanoimprint;
- template;
- GISAXS;
- cross-sectional profile;
- hole patterns;
47.Mask CD relationship to temperature at the time backscatter is received

机译：收到掩模CD与温度后的温度接收
- 作者：Harold Zable;Tom Kronmiller;Ryan Pearman;Bill Guthrie;Nagesh Shirali;Yukihiro Masuda;Takashi Kamikubo;Noriaki Nakayamada;Aki Fujimura
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Mask;
- variable shaped beam;
- VSB;
- mask data preparation;
- MDP;
- mask process correction;
- MPC;
- thermal correction;
- TEC;
48.GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000

机译：GPU加速的内联线性校正：MBM-1000的像素级剂量校正（PLDC）
- 作者：Harold Zable;Hironobu Matsumoto;Kenichi Yasui;Ryosuke Ueba;Noriaki Nakayamada;Nagesh Shirali;Yukihiro Masuda;Ryan Pearman;Aki Fujimura
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Mask;
- multi-beam;
- mask data preparation;
- MDP;
- mask process correction;
- MPC;
- mid-range effect correction;
- MEC;
- pixel dose level correction;
- PLDC;
49.Research on Fabrication of Resist Mold patterns for Electroplating

机译：电镀抗蚀剂模具图案的制造研究
- 作者：Kouta Shimizu;Yuhto Nishida;Toshiyuki Horiuchi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- thick resist;
- vertical side wall;
- rectangular cross section;
- projection exposure;
- electroplating;
50.LMS IPRO: Enabling accurate registration metrology on SiN-based Phase-Shift Masks

机译：LMS IPRO：在基于SIN的阶段移位面具上启用准确的注册计量
- 作者：Hendrik Steigerwald;Runyuan Han;Alexander Buettner;Klaus-Dieter Roeth
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- LMS IPRO;
- Metrology;
- Registration;
- Phase-Shift Mask;
51.eBeam Initiative Survey Reports Confidence in EUV and Multi-beam Technology

机译：EBEMEM倡议调查报告了对EUV和多光束技术的信心
- 作者：Aki Fujimura;Jan Willis
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- eBeam;
- multi-beam;
- EUV;
- NIL;
- DSA;
- NGL;
- Survey;
52.Overcoming EUV Mask Blank Defects: What we can, and what we should

机译：克服EUV掩码空白缺陷：我们可以，以及我们应该是什么
- 作者：Rik Jonckheere
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- EUV lithography;
- EUV mask;
- mask defects;
- ML-defects;
- phase defects;
- mitigation;
53.Electrolytic Etching of Fine Stainless-Steel Pipes Patterned by Laser-Scan Lithography

机译：通过激光扫描光刻图案化的精细不锈钢管的电解蚀刻
- 作者：Hiroshi Takahashi;Tomoya Sagara;Toshiyuki Horiuchi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- electrolytic etching;
- undercut;
- laser-scan lithography;
- ultra-fine pipe;
- slit pattern;
54.Old and new techniques mixed up into optical photomask measurement method

机译：旧的和新技术混合到光学光掩模测量方法中
- 作者：Jumpei Fukui;Yusaku Tachibana;Makoto Osanai
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- photomask;
- automation;
- CD measurement;
- i-line;
55.Data preparation in the age of curvilinear patterns

机译：曲线图案时代的数据准备
- 作者：Sebastien Bayle;Charles Tiphine;Matthieu Millequant;Thiago Figueiro;Luc Martin;Sergei Postnikov;Patrick Schiavone
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- electron beam lithography;
- mask data preparation;
- model-based;
- verification;
- proximity correction;
56.Application of Advanced Structure to Multi-Tone Mask for FPD Process

机译：高级结构在FPD过程中的多色调面膜中的应用
- 作者：Jin-Han Song;Jin-Woong Jeong;Kyu-Sik Kim;Woo-Gun Jeong;Sang-Pil Yun;Dong-Heok Lee;Sang-Soo Choi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- Half-tone mask;
- Cr-based MTM;
- Cr-/MoSi-based MTM;
57.Fabrication of Cylindrical Micro-Parts Using Synchronous Rotary Scan-Projection Lithography and Chemical Etching

机译：使用同步旋转扫描投影光刻和化学蚀刻的圆柱微零件的制造
- 作者：Kaiki Ito;Yuta Suzuki;Toshiyuki Horiuchi
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- scan-projection lithography;
- chemical etching;
- cylindrical pipe;
- stent;
58.Electron beam lithographic modeling assisted by artificial intelligence technology

机译：电子束光刻建模人工智能技术辅助
- 作者：Noriaki Nakayamada;Rieko Nishimura;Satoru Miura;Haruyuki Nomura;Takashi Kamikubo
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- electron beam lithography;
- machine learning;
- point-spread function tuning;
- proximity effect;
- charging effect;
59.Application of EB repair for nanoimprint lithography template

机译：EB修复对纳米压印光刻模板的应用
- 作者：Ai Kumada;Keiko Morishita;Keisuke Yagawa;Ryoji Yoshikawa;Takashi Hirano;Masamitsu Itoh
- 会议名称：《Symposium on photomask and next-generation lithography mask technology》 | 2017年
- EB;
- repair;
- nanoimprint;
- lithography;
- defect;