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机译:热退火对掺杂Ga的ZnO薄膜电学和光学性能的影响
Materials Design Center, Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami, Kochi 782-8502, Japan;
Materials Design Center, Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami, Kochi 782-8502, Japan;
Materials Design Center, Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami, Kochi 782-8502, Japan;
Materials Design Center, Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami, Kochi 782-8502, Japan;
Research and Development Center, Geomatec Co., Ltd., Ohtaku, Tokyo 146-0093, Japan;
Research and Development Center, Geomatec Co., Ltd., Ohtaku, Tokyo 146-0093, Japan;
Research and Development Center, Geomatec Co., Ltd., Ohtaku, Tokyo 146-0093, Japan;
Hachioji R&D Center, Casio Computer Co., Ltd., Ishikawa-cho, Hachioji, Tokyo 192-8556, Japan;
Hachioji R&D Center, Casio Computer Co., Ltd., Ishikawa-cho, Hachioji, Tokyo 192-8556, Japan;
Materials Design Center, Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami, Kochi 782-8502, Japan;
transparent conductive oxide; ZnO:Ga; Ga-doped ZnO; thermal stability; optical mobility;
机译:真空退火对喷雾沉积Ga掺杂ZnO薄膜的结构,光学和电学性质的影响
机译:退火处理对射频磁控溅射沉积Ga掺杂ZnO薄膜的结构,电学和光学性质的影响
机译:锌的热脱附导致多晶掺杂Ga的ZnO薄膜电学和光学性质的变化
机译:热退火对掺杂Ga的ZnO薄膜电学,光学和结构性能的影响
机译:原位热退火工艺对脉冲激光沉积制造CDS Cdte薄膜太阳能电池结构,光学和电性能的影响
机译:快速热退火对原子层沉积生长Zr掺杂ZnO薄膜的结构电学和光学性质的影响
机译:掺杂浓度和退火温度对溶胶 - 凝胶法对Ga掺杂ZnO薄膜电和光学性质的影响