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A modified layer-removal method for residual stress measurement in electrodeposited nickel films

机译:一种改进的去除电沉积镍膜残余应力的层去除方法

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摘要

Combining the traditional layer-removal method with a cantilever beam model, a modified layer-removal method is developed and used to measure residual stress in single and multi-layer electrodeposited nickel films with thickness of 2.5 μm. The out-of-plane displacement of the free tip of a cantilever beam is measured by the digital speckle correlation method. The results show that residual stress in a single semimat nickel film is compressive, while in a multi-layer system composed of dark, semimat and holophote nickel, residual stress in the surface layer is tensile. Residual stress decreases gradually with the increase of etching depths of single and multi-layer films. These findings are in qualitative agreement with nanoindentation tests, which confirms the reliability of the modified layer-removal method.
机译:结合传统的层去除方法和悬臂梁模型,开发了一种改进的层去除方法,用于测量厚度为2.5μm的单层和多层电沉积镍膜中的残余应力。悬臂梁的自由末端的平面外位移是通过数字散斑相关方法测量的。结果表明,单层半哑镍膜中的残余应力是压缩性的,而在由深色,半层镍和全息镍构成的多层体系中,表面层中的残余应力为拉伸性的。随着单层和多层膜刻蚀深度的增加,残余应力逐渐减小。这些发现与纳米压痕测试在质量上是一致的,这证实了改进的去除层方法的可靠性。

著录项

  • 来源
    《Thin Solid Films》 |2011年第10期|p.3249-3253|共5页
  • 作者单位

    Key Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education, Xiangtan University, Hunan 411105, China, College of Packaging and Material Engineering, Hunan University of Technology, Hunan 412007, China;

    Key Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education, Xiangtan University, Hunan 411105, China;

    Faculty of Mathematics and Physics, University of South China, Hunan 421001, China;

    Key Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education, Xiangtan University, Hunan 411105, China;

    Key Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education, Xiangtan University, Hunan 411105, China;

    Key Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education, Xiangtan University, Hunan 411105, China;

    Department of Mechanical Engineering, Curtin University, Western Australia 6845, Australia;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    layer-removal method; nickel; thin films; residual stress; nanoindentation;

    机译:脱层法;​​镍;薄膜;残余应力;纳米压痕;

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