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首页> 外文期刊>Thin Solid Films >Highly conductive and transparent aluminum-doped zinc oxide thin films deposited on polyethylene terephthalate substrates by pulsed laser deposition
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Highly conductive and transparent aluminum-doped zinc oxide thin films deposited on polyethylene terephthalate substrates by pulsed laser deposition

机译:通过脉冲激光沉积在聚对苯二甲酸乙二醇酯基板上沉积的高导电性和透明的掺杂铝的氧化锌薄膜

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摘要

Highly transparent and conductive aluminum-doped zinc oxide thin films were deposited on low-cost flexible polyethylene terephthalate substrates at room temperature using pulsed laser deposition and the effects of oxygen pressure and film thickness on film properties were investigated. It was found that grain sizes play a greater role only at smaller film thicknesses in affecting carrier mobility. Resistivity changes at larger film thickness can be caused by near surface/interface depletion that affected both mobility and carrier concentration. The inherent film transparency did not change and any reduction in the film transmittance is likely related to a thickness dependent attenuation effect This means that different transparent conducting oxides should each possess an optimum film thickness, whereby optimized zinc oxide is typically about 100 nm. A low resistivity of ~6.6 × 10~(-4) Ω cm with a high normalized transparency index of > 0.9 for a 110 ± 10 nm thick room-temperature deposited film was obtained, representing one of the best results obtained to date.
机译:在室温下使用脉冲激光沉积将高透明和导电的铝掺杂氧化锌薄膜沉积在低成本柔性聚对苯二甲酸乙二醇酯基板上,并研究了氧气压力和膜厚对膜性能的影响。已经发现,晶粒尺寸仅在较小的膜厚度下才在影响载流子迁移率中发挥更大的作用。较大的薄膜厚度下的电阻率变化可能是由影响迁移率和载流子浓度的近表面/界面损耗所致。固有的膜透明性没有改变,并且膜透射率的任何降低很可能与取决于厚度的衰减效应有关。这意味着不同的透明导电氧化物应各自具有最佳膜厚度,由此优化的氧化锌通常为约100 nm。对于110±10 nm厚的室温沉积膜,获得了低电阻率〜6.6×10〜(-4)Ωcm和高归一化透明指数> 0.9,这是迄今为止获得的最佳结果之一。

著录项

  • 来源
    《Thin Solid Films》 |2013年第31期|285-290|共6页
  • 作者单位

    Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research link, Singapore 117602, Singapore;

    Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research link, Singapore 117602, Singapore;

    Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore;

    Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research link, Singapore 117602, Singapore;

    Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research link, Singapore 117602, Singapore;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Transparent conducting oxide; Aluminum zinc oxide; Pulsed laser deposition; Polyethylene terephthalate; Thickness dependence; AZO; PLD; TCO;

    机译:透明导电氧化物;铝氧化锌;脉冲激光沉积聚对苯二甲酸;厚度依赖性;偶氮;PLD;总拥有成本;

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