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Comparative analysis of structural and photoelectrochemical properties of pure and Sb doped SnO_2 functional electrode

机译:纯和掺Sb SnO_2功能电极的结构和光电化学性能的比较分析

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The purpose of this work was to analyze the electrochemical properties (C-E) and (I-E) of SnO2 thin films grown onto glass substrates by atmospheric pressure chemical vapor deposition (APCVD) and to correlate them with the microstructure i.e. texture and crystallography. The microstructure is one of the authentic monitor and the "memory" of materials processing that influences strongly the physical properties. The polycrystalline films present a good crystallinity; all peaks are assigned to the rutile phase and the films texture shows a dependence on the preparation conditions. The films deposited by APCVD under different conditions and Sb doping have been characterized by the Mott-Schottky plots and electrochemical impedance spectroscopy (EIS) both in the dark and under illumination. The photoelectrochemical results show the effectiveness of SnO2 films toward the chromate reduction. The structures like Sb doped SnO2-glass/chromate solution provide variable electrochemical properties as well as different absorbance under solar light which confirm the reduction of HCrO4- to trivalent state. We also show, through the EIS graphical representation of SnO2-Sb films-glass/chromate solution that the values of the electrical components relaxation system, conductivity and dielectric constants, are correlated with both the growth conditions and doping level.
机译:这项工作的目的是分析通过大气压化学气相沉积(APCVD)在玻璃基板上生长的SnO2薄膜的电化学性质(C-E)和(I-E),并将它们与微观结构(即织构和晶体学)相关联。微观结构是真实的监测器之一,是材料加工的“记忆”之一,会极大地影响物理性能。多晶膜具有良好的结晶度;所有的峰都分配给金红石相,膜的质地显示出对制备条件的依赖性。在黑暗和光照下,通过Mott-Schottky图和电化学阻抗谱(EIS)表征了在不同条件和Sb掺杂下通过APCVD沉积的薄膜。光电化学结果表明,SnO2膜对减少铬酸盐的有效性。诸如掺Sb的SnO2-玻璃/铬酸盐溶液之类的结构可提供可变的电化学性能以及在太阳光下的不同吸收率,这证实了HCrO4-还原为三价态。通过EIS SnO2-Sb薄膜-玻璃/铬酸盐溶液的EIS图形表示,我们还表明,电学成分弛豫系统,电导率和介电常数的值与生长条件和掺杂水平相关。

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