In situ spectroellipsometric analysis of plasma treatments of polymers for the adhesion improvement of silica thin films

A. Hofrichter; P. Bulkin; B. Drevillon

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In situ spectroellipsometric analysis of plasma treatments of polymers for the adhesion improvement of silica thin films

机译：聚合物等离子体处理的原位分光光度法分析，用于改善二氧化硅薄膜的附着力

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Plasma enhanced chemical vapour deposition (PECVD) is increasingly used for the fabrication of functional coatings on polymeric substrates. Frequently a preliminary plas- ma treatment is used to increase the adherence of the deposited films.

机译：等离子体增强化学气相沉积（PECVD）越来越多地用于在聚合物基材上制备功能性涂层。通常，采用初步的等离子体处理来增加沉积膜的附着力。

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《Le Vide》 |1999年第294期|p.393-397|共5页
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A. Hofrichter; P. Bulkin; B. Drevillon;
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In situ spectroellipsometric analysis of plasma treatments of polymers for the adhesion improvement of silica thin films

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