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首页> 外文期刊>Surface Science >Self-assembly of porphyrin molecules on a Cu(111) electrode: Influence of different anions and electrode potential
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Self-assembly of porphyrin molecules on a Cu(111) electrode: Influence of different anions and electrode potential

机译:卟啉分子在Cu(111)电极上的自组装:不同阴离子和电极电势的影响

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In this contribution, we provide a view on the role of halide interlayers in the self-assembly of layers of organic molecules at metal-electrolyte interfaces with molecular resolution. In particular, the ordering of tetra(4-trimethylammoniophenyl) porphyrin molecules in cationic form, abbreviated as [H(2)TTMAPP](4+), has been studied on a Cu(111) electrode surface in aqueous solution containing chloride-, bromide- or iodide-anions using a combination of cyclic voltammetry (CV) and in-situ electrochemical scanning tunneling microscopy (EC-STM). On the one hand the obtained results unveil that the degree of ordering of the self-assembled layer of [H(2)TTMAPP](4+) cations on the Cu(111) surface changes significantly when changing the halide anion in the working electrolyte, and, thereby, the buffer layer between the Cu(111) surface and the adsorbed [H(2)771VIAPP](4+) molecular cations. Under the same experimental conditions a fully ordered layer is observed on the chloride precovered Cu(111) surface, but less ordering and even incomplete monolayer formation are found on the bromide and iodide terminated Cu(111) surface, respectively; the degree of order decreases with decreasing electronegativity of the underlying halide. On the other hand potential driven reduction of the organic species lowers the charge density of the organic cations themselves causing a desorption of the reduced molecules at even lower potentials from any of the three differently halide modified electrode surfaces. Both observations underline the importance of electrostatic interactions in the adsorption and structure formation of the porphyrin molecules on the halide modified surfaces.
机译:在这一贡献中,我们提供了关于卤化物夹层在分子分辨率下在金属-电解质界面处有机分子层自组装中的作用的观点。特别是,在含氯离子的水溶液中,在Cu(111)电极表面上研究了阳离子形式的四(4-三甲基氨苯基)卟啉分子的顺序,缩写为[H(2)TTMAPP](4+)。使用循环伏安法(CV)和原位电化学扫描隧道显微镜(EC-STM)结合使用溴化或碘化​​阴离子。一方面,获得的结果揭示了,当改变工作电解质中的卤化物阴离子时,[H(2)TTMAPP](4+)阳离子在Cu(111)表面上的自组装层的有序度发生了显着变化。 ,从而在Cu(111)表面和吸附的[H(2)771VIAPP](4+)分子阳离子之间形成缓冲层。在相同的实验条件下,在氯化物覆盖的Cu(111)表面上观察到完全有序的层,但是在溴化物和碘化物封端的Cu(111)表面上分别发现较少的有序甚至单层不完整;随着下层卤化物电负性的降低,有序度降低。另一方面,电势驱动的有机物质的还原降低了有机阳离子本身的电荷密度,从而导致还原的分子以甚至更低的电势从三个不同的卤化物改性的电极表面中的任何一个解吸。两项发现都强调了静电相互作用对卤化物改性表面上卟啉分子的吸附和结构形成的重要性。

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