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首页> 外文期刊>Surface Science >Observation of a (√3 x √3)-R30° reconstruction on GaN(0001) by RHEED and LEED
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Observation of a (√3 x √3)-R30° reconstruction on GaN(0001) by RHEED and LEED

机译:用RHEED和LEED在GaN(0001)上观察(√3x√3)-R30°重建

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摘要

A new reconstruction of √3 x √3-R30° has been observed on a GaN film grown on a 6H-SiC (0001)-√3 x √3 surface using RHEED and LEED experimental techniques. The experimental LEED PF shows that the GaN film is Ga-terminated hexagonal. The surface is a mixture of two structures with a single bilayer height difference between them. One is a √3 x √3-R30° reconstruction with Ga-adatoms occupying the T4 sites. Another is a Ga-terminated 1 x 1 with no extra Ga on top. The area ratio of the √3 x √3 part to the 1 x 1 part is slightly larger than 1. The first principle total energy calculations and Tensor-LEED Ⅰ-Ⅴ curves simulations further confirm this structure model.
机译:使用RHEED和LEED实验技术,在6H-SiC(0001)-√3x√3表面上生长的GaN膜上观察到了√3x√3-R30°的新构造。 LEED PF实验表明,GaN膜为Ga端六角形。表面是两个结构的混合物,它们之间只有一个双层高度差。一种是√3x√3-R30°重建,Ga原子占据T4位。另一个是Ga端接的1 x 1,顶部没有多余的Ga。 √3x√3部分与1 x 1部分的面积比略大于1。第一原理总能量计算和Tensor-LEEDⅠ-Ⅴ曲线模拟进一步证实了该结构模型。

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