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Growth and alloy formation of ultrathin Ni films on Co/Pt(111)

机译:Co / Pt(111)上超薄Ni膜的生长和合金形成

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Low-energy electron diffraction (LEED) and Auger electron spectroscopy (AES) were used to study the growth and the structural evolution of Ni/Co/Pt(111) following high-temperature annealing. From the oscillation of the specular beam of the LEED and Auger uptake curve, we concluded that the growth mode of thin Ni films on 1 ML Co/Pt(111) is at least 2 ML layer-by-layer growth before three-dimensional island growth begins. The alloy formation of Ni/1 ML Co/Pt(111) was analyzed by AES. The temperature for the intermixing of Ni and Co layers in the upper interface without diffusing into the bulk of Pt is independent of the thickness of Ni when a Co buffer is one atomic monolayer. After the temperature was increased, formations of Ni-Co-Pt alloy, Ni-Pt alloy and Co-Pt alloy were observed. The temperature required for the Ni-Co intermixing layer to diffuse into Pt bulk increases with the thickness of Ni. The interlayer distance as a function of annealing temperature for 1 ML Ni/1 ML Co/Pt(111) was calculated from the Ⅰ-Ⅴ LEED. The evolution of LEED patterns was also observed at different annealing temperatures.
机译:利用低能电子衍射(LEED)和俄歇电子能谱(AES)研究了高温退火后Ni / Co / Pt(111)的生长和结构演变。从LEED的镜面光束的振荡和俄歇吸收曲线,我们得出结论,在三维岛上,1 ML Co / Pt(111)上Ni薄膜的生长模式至少逐层生长2 ML。增长开始。通过AES分析了Ni / 1 ML Co / Pt(111)的合金形成。当Co缓冲层为一个原子单层时,上层界面中的Ni和Co层混合而不扩散到大部分Pt中的温度与Ni的厚度无关。温度升高后,观察到Ni-Co-Pt合金,Ni-Pt合金和Co-Pt合金的形成。 Ni-Co混合层扩散到Pt块中所需的温度随着Ni的厚度而增加。由Ⅰ-ⅤLEED计算出1 ML Ni / 1 ML Co / Pt(111)的层间距离与退火温度的关系。在不同的退火温度下,也观察到了LEED模式的演变。

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