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首页> 外文期刊>Surface Science >Formation of vinylidene and vinylene by selective reactivity of Si(100)2 x 1 towards iso, cis and trans isomers of dichloroethylene
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Formation of vinylidene and vinylene by selective reactivity of Si(100)2 x 1 towards iso, cis and trans isomers of dichloroethylene

机译:通过Si(100)2 x 1对二氯乙烯的异,顺和反式异构体的选择性反应形成亚乙烯基和亚乙烯基

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The room temperature (RT) chemisorption of three (wo, cis and trans) isomers of dichloroethylene (DCE) on Si(l 00)2 x 1 have been investigated by X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption (TPD). Unlike ethylene, the lack of molecular desorption features in the TPD data effectively rules out the cycloaddition adsorption mechanism for all three isomers. XPS spectra show that cis- and trans-DCE adsorb dissociatively on the 2 x 1 surface in equal proportion as mono-σ bonded 2-chlorovinyl and di-σ bonded vinylene adspecies, which could be produced by dechlorination mechanisms involving the proposed tri-atom π-complex and diradical intermediates, respectively. Acetylene (m/z 26) evolution from 2-chlorovinyl adspecies at 590 K and vinylene at 750 K are also observed for both cis- and trans-DCE, further confirming the common adsorption mechanisms for these geometrical isomers and the relative stabilities of the adspecies. In contrast, only vinylidene adspecies is found for iso-DCE, which indicates that the high ionicity of the =CCl_2 group favours the diradical dechlorination mechanism. The single m/z 26 desorption peak for iso-DCE adspecies observed at a higher temperature (780 K) than cis and trans isomers is consistent with the higher adsorption energy of vinylidene than vinylene on Si(100) obtained in our ab initio calculations. The different relative locations of the Cl atoms in these isomers therefore play a crucial role in controlling the adsorption and thermal evolution on Si(100)2 x 1. The selective reactivity of the 2 x 1 surface towards these isomers can be used to generate vinylene or vinylidene templates from their corresponding adspecies.
机译:通过X射线光电子能谱(XPS)和程序升温脱附(TPD)研究了二氯乙烯(DCE)的三种(wo,顺式和反式)异构体在Si(l 00)2 x 1上的室温(RT)化学吸附。与乙烯不同,TPD数据中分子脱附特性的缺乏有效地排除了所有三种异构体的环加成吸附机理。 XPS光谱表明,顺-DCE和反-DCE分解解离地吸附在2 x 1表面上的比例与单σ键合的2-氯乙烯基和双σ键合的亚乙烯基的比例相同,这可以通过涉及拟议的三原子的脱氯机理制得分别为π络合物和双自由基中间体。还观察到顺式和反式DCE都从590 K处的2-氯乙烯基甲乙炔和750 K处的亚乙烯乙炔(m / z 26)演化出,进一步证实了这些几何异构体的常见吸附机理以及该形态的相对稳定性。相比之下,仅异亚乙基酯的亚乙烯基存在,这表明= CCl_2基团的高离子性有利于双自由基脱氯机理。在比顺式和反式异构体更高的温度(780 K)下观察到的iso-DCE形态的单个m / z 26解吸峰与我们从头算计算得出的亚乙烯基比亚乙烯基在Si(100)上的更高吸附能是一致的。因此,这些异构体中Cl原子的不同相对位置在控制Si(100)2 x 1上的吸附和热释放中起着至关重要的作用。2 x 1表面对这些异构体的选择性反应性可用于生成亚乙烯基。或相应亚乙烯基的亚乙烯基模板。

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