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首页> 外文期刊>Surface Science >Structure of MgO/V/MgO(001) thin films studied by the combination of X-ray photoemission and ion beam analysis techniques
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Structure of MgO/V/MgO(001) thin films studied by the combination of X-ray photoemission and ion beam analysis techniques

机译:X射线光发射与离子束分析技术相结合研究MgO / V / MgO(001)薄膜的结构

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摘要

The structure of epitaxial 40 A thick V(001) films grown at room and high temperature (723 K) in MgO/V/MgO(001) model hetero-structures is studied in detail by means of X-ray photoemission spectroscopy, Rutherford backscattering spectrometry and elastic recoil detection analysis. The resulting structures of samples grown at both temperatures is very similar, including the eventual contamination by hydrogen in the V layer, and only subtle modifications at the V/MgO(001) interface have been observed. These differences at the very first V layers grown on MgO(001) surface could infer in the growth of the subsequent V layers. The influence of the nature of the V oxides at the V/MgO(001) interface on the properties of the 40 A thick V(001) films is discussed.
机译:利用X射线光电子能谱,卢瑟福背散射等研究了MgO / V / MgO(001)模型异质结构中在室温和高温(723 K)下生长的40 A厚V(001)外延薄膜的结构。光谱分析和弹性后坐力检测分析。在两个温度下生长的样品的最终结构非常相似,包括最终被V层中的氢污染,并且仅观察到V / MgO(001)界面的细微修饰。这些在MgO(001)表面上生长的第一V层处的差异可能会导致随后的V层生长。讨论了V / MgO(001)界面上V氧化物的性质对40 A厚V(001)薄膜性能的影响。

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