Particle and yield analysis

摘要

In semiconductor fabrication, optimized control over hundreds of process steps and multiple equipment sets is essential to achieving high yields in volume manufacturing. A "statistical dashboard" concept, originally created 10 years ago, has evolved with enhancements and additional algorithms to increase automatic analysis of process test results from a centralized database for particle reduction and yield improvement. Two new statistical tools have been added to the dashboard to separately identify random and systematic yield losses on product wafers for improvements in process defectivity.