Applications of spin-on hybrid BARCs for FEOL and BEOL integration

摘要

Bottom antireflective coatings (BARC) enable semiconductor manufacturers to control substrate reflectivity, improve critical dimension (CD) patterning, and increase depth of focus in high-resolution photolithography. Organic BARC films are generally spin-on polymeric materials, while inorganic BARCs are applied with chemical vapor deposition (CVD). Both types of BARCs present challenges as feature sizes shrink and etching becomes more difficult due to very thin ArF resist layers in 193nm photolithography processes. A new class of spin-on hybrid BARC combines the properties of CVD and spin-on materials for tuned etch selectivity due to inorganic functionality, but also exhibits the reflectivity-controlling properties of organic BARC films.