Molecular Imprints announces 4WPH step and flash imprint tool

摘要

Claiming the ability to print 32nm, 28nm, and 22nm features at 4WPH with 35nm overlay, Molecular Imprints, Inc. (MII) says its latest imprint lithography tool for semiconductor applications, the Imprio 300, introduced at the SPIE Advanced Lithography Symposium, is the "only game in town" for semiconductor prototyping and process development in the < 30nm realm. "Our unique technology imprints into liquid at room temperature, facilitating overlay," according to CEO Mark Melliar-Smith, who discussed the technology in an interview with SST. The step-and-flash tools are drop-in replacements for optical, exposure tools, completely compatible wit current processes." He provided slides showing that working FinFET transistors have already been patterned at 20 and 30nm and resist CD uniformity demonstrated at 0.8nm with LER < 2nm.