OPC model separability speeds computational lithography

摘要

In low k_1 lithography, process integration and qualification are of little value without OPC-corrected masks. Robust separable models that permit optics and resists to be modeled independently allow accurate OPC results to be obtained much faster, shortening the qualification process for both tools and OPC. With the RET strategy decided and the necessary corrections predicted accurately, OPC-corrected masks can be ready as soon as new tools come on line, dramatically accelerating time to production.