The Duo photoresist coat/ develop track platform features a unique dual-track design which distributes the load to reduce wafer transfer speed even at high output rates - 250-300 wafers/ hour depending on configuration, the company claims -and ensure nonstop operation, increasing wafer output/unit area by up to 40% compared with previous systems. The system supports a variety of lithography processes, including immersion ArF double patterning; various system configurations can be tailored to match specific coat/develop applications.
展开▼
