Etch Performance Of Ar_2/f_2 For Cvd/ald Chamber Clean

摘要

The selected Ar/N_2/F_2 mixture can be applied as a drop-in replacement to the existing cleaning chemistries. The tests have been carried out on an industrial tool - an AMAT P5000 - which was demonstrated to be fully compatible with the new cleaning gas. The F_2 gas line was connected to the existing CF_4 gas line by applying a 3-way purging unit. The F_2 mixture is compatible with stainless steel if a proper passivation procedure is performed.