Improving etch performance using in situ gas flow monitoring and control

摘要

As the industry continues to scale, the performance of a toot's gas flow delivery system is becoming increasingly important. Next-generation processes are putting demands on gas flow control that leading-edge mass flow controller (MFC) technologies are struggling to meet. As a result, accurate monitoring and control of the variations in gas flow is vital to ensure process stability, maximize yield, and increase tool productivity. This article outlines an approach for improving etch equipment performance through a high accuracy in situ gas flow monitoring system and control scheme.