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New type of defects related to nonuniform distribution of compensating centers in p-GaN films

机译:与p-GaN膜中补偿中心的不均匀分布有关的新型缺陷

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摘要

A new type of defects in Mg doped p-GaN films was detected and studied by means of microcathodoluminescence (MCL) imaging and electron beam induced current (EBIC) imaging in scanning electron microscope. The defects consist of small (about 10 μm) regions in which the MCL intensity is increased and the EBIC signal is decreased. Such behavior is explained by local increase of the hole density due to decreased concentration of compensating native donor defects. The density of these regions of enhanced hole concentration becomes higher and the characteristic dimensions lower in the samples with lower crystalline perfection which suggests diffusion controlled nucleation around nucleation sites. The defects of the above described nature are only detected in heavily Mg doped samples with the Mg concentration exceeding some 10~(19) cm~(-3) which is most likely related to less efficient formation of compensating donor defects in less heavily doped samples.
机译:在扫描电子显微镜中,通过微阴极发光(MCL)成像和电子束感应电流(EBIC)成像,检测并研究了掺杂Mg的p-GaN膜中的新型缺陷。缺陷由MCL强度增加而EBIC信号减小的小区域(约10μm)组成。这种现象可以通过补偿天然供体缺陷的浓度降低而导致空穴密度局部增加来解释。这些具有提高的空穴浓度的区域的密度在具有较低结晶完美度的样品中变得更高,并且特征尺寸更低,这表明在成核位置周围扩散控制成核。具有上述性质的缺陷仅在Mg浓度超过10〜(19)cm〜(-3)的高Mg掺杂样品中检测到,这很可能与低重掺杂样品中补偿供体缺陷形成效率较低有关。

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