首页> 外文期刊>Solid-State Electronics >A closed-form DC model for long-channel thin-film transistors with gate voltage-dependent mobility characteristics
【24h】

A closed-form DC model for long-channel thin-film transistors with gate voltage-dependent mobility characteristics

机译:具有与栅极电压有关的迁移率特性的长沟道薄膜晶体管的闭式DC模型

获取原文
获取原文并翻译 | 示例
           

摘要

A model is derived for the drain current (under DC steady-state operating conditions) of a long-channel thin-film transistor (TFT) with gate voltage-dependent channel mobility. A closed-form expression is obtained for cases in which the average mobility (μ_(avg)) can be reasonably approximated by an nth-order polynomial curve fit; a more generalized expression allows the substitution of an arbitrary parameterized equation for μ_(avg), yielding a closed-form expression in cases where the form of the selected mobility expression is such that the requisite integration can be carried out analytically. The model is employed to replicate measured drain current versus drain voltage (Ⅰ_D-Ⅴ_(DS)) curves for exemplary zinc oxide and zinc tin oxide channel TFTs with highly non-ideal (i.e., gate voltage-dependent) mobility characteristics; in each case, excellent correlation to measured Ⅰ_D-Ⅴ_(DS) data is obtained, thus validating the proposed model. This model comprises a valuable tool in the preliminary development of novel TFTs for which standard device models are not, in general, appropriate.
机译:推导了具有与栅极电压有关的沟道迁移率的长沟道薄膜晶体管(TFT)的漏极电流(在DC稳态工作条件下)的模型。对于可以通过n阶多项式曲线拟合合理地近似平均迁移率(μ_(avg))的情况,可以获得闭合形式的表达式;更通用的表达式允许将任意参数化的方程式替换为μ_(avg),在所选迁移率表达式的形式使得可以通过分析进行必要积分的情况下,产生封闭形式的表达式。该模型用于复制示例氧化锌和氧化锌锡沟道TFT的实测漏极电流与漏极电压(Ⅰ_D-Ⅴ_(DS))曲线,该曲线具有极高的非理想(即取决于栅极电压)迁移率特性;在每种情况下,都与测得的Ⅰ_D-Ⅴ_(DS)数据具有良好的相关性,从而验证了所提出的模型。该模型在新型TFT的初步开发中包含了一个有价值的工具,而标准设备模型通常不适用于这些TFT。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号