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Modeling the DC gain of 4H-SiC bipolar transistors as a function of surface recombination velocity

机译:根据表面复合速度对4H-SiC双极晶体管的DC增益进行建模

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摘要

Two dimensional device modeling is used to investigate the differential DC current gain in 4H-SiC bipolar junction transistors using surface recombination velocity as one of the physical variables affecting the current gain. The simulated differential gain is compared with the measured experimental DC gain of transistors with two different emitter lengths. The comparison and the analysis made support the trend in modeling the DC gain as a function of surface recombination velocity and show that higher gain can be obtained for transistors with lower surface recombination velocity.
机译:二维器件建模用于研究4H-SiC双极结型晶体管的差分DC电流增益,使用表面复合速度作为影响电流增益的物理变量之一。将模拟差分增益与测量的具有两个不同发射极长度的晶体管的实验直流增益进行比较。比较和分析支持了将DC增益建模为表面复合速度的函数的趋势,并表明对于具有较低表面复合速度的晶体管可以获得更高的增益。

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