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A novel analytical model for the breakdown voltage of thin-film SOI power MOSFETs

机译:薄膜SOI功率MOSFET击穿电压的新型分析模型

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摘要

A novel analytical model for the surface field distribution and breakdown voltage of thin-film silicon on insulator (SOI) power MOSFETs has been proposed. The analytical solutions for the surface potential and field distribution are derived on the basis of the two-dimensional Poisson equation. From these expressions, the dependence of breakdown voltage on the device parameters is carefully examined. The validity of this model is demonstrated by comparison with numerical simulations and experimental data. Compared with other analytical models, this approach is more suitable to explain the breakdown behavior.
机译:提出了一种新型的绝缘体上覆硅薄膜功率MOSFET的表面场分布和击穿电压分析模型。根据二维泊松方程推导了表面势和场分布的解析解。根据这些表达式,仔细检查了击穿电压对器件参数的依赖性。通过与数值模拟和实验数据的比较证明了该模型的有效性。与其他分析模型相比,此方法更适合于解释故障行为。

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