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Modified boundary condition at Si-SiO_2 interface for modeling of threshold voltage and subthreshold swing of short-channel SOI MESFET's

机译:Si-SiO_2界面处的修改边界条件,用于建模短沟道SOI MESFET的阈值电压和亚阈值摆幅

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摘要

Superposition technique to solve the two dimensional (2-D) Poisson's equation is a widely used method for the analytical modeling of potential distribution and threshold voltage of short-channel FET devices. In this method, the solution of the 2-D Poisson's equation is considered as the superposition of the solutions of the 1-D Poisson's equation used for the long channel devices and a homogeneous Laplace equation which is used to include the effects of the short-gate length on the potential function of the device. Such a method was used by Chiang et. al. [1] to model the threshold voltage and subthreshold swing of short-channel SOI MESFET's. However, the boundary condition described in [1] at the Si-SiO_2 interface may yield ψ_S (x, t_(Si)) = 0 for all values of x, eliminating short-channel effects that may play an important role. Further, Chiang et. al. have chosen an approximate solution of their Eq.
机译:求解二维(2-D)泊松方程的叠加技术是一种广泛用于短通道FET器件的电势分布和阈值电压分析建模的方法。在这种方法中,将二维Poisson方程的解视为长通道设备所用的1-D Poisson方程和均质Laplace方程(包括短波效应)的叠加。栅极长度取决于器件的电位函数。蒋等人使用了这种方法。等[1]对短通道SOI MESFET的阈值电压和亚阈值摆幅建模。但是,[1]中描述的Si-SiO_2界面处的边界条件对于所有x值都可能产生ψ_S(x,t_(Si))= 0,从而消除了可能起重要作用的短通道效应。此外,蒋等。等选择了他们的方程的近似解。

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