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Modelling of semiconductor diodes made of high defect concentration, irradiated, high resistivity and semi-insulating material: The capacitance-voltage characteristics

机译:高缺陷浓度,高辐射,高电阻率和半绝缘材料制成的半导体二极管的建模:电容-电压特性

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摘要

Full modelling is reported of the capacitance of a long PIN semiconductor diode with a high concentration of generation-recombination (g-r) centres and different concentrations of deep traps. There are considerable differences from the textbook results given for normal lifetime diodes which have low concentrations of g-r centres. For a low density of g-r centres, the capacitance is the usual value. That is it decreases as V~(1/2) with increasing reverse bias while it increases rapidly with increasing forward bias. For high density of g-r centres and in reverse bias a departure from this voltage dependence is observed, while in forward bias a negative.capacitance appears. This agrees with experiment. From these results we present a physical understanding of the processes involved. There are specific applications of these results to radiation damaged devices, lifetime killed diodes and devices made from high resistance and semi-insulating materials, especially in the interpretation of the C-V curves to evaluate the fixed space charge density.
机译:完全建模的报道了一个长PIN半导体二极管的电容,该二极管具有高浓度的生成复合(g-r)中心和不同浓度的深陷阱。与教科书中给出的有关正常寿命二极管(g-r中心浓度低)的结果存在很大差异。对于低密度的g-r中心,电容是通常的值。也就是说,随着反向偏压的增加,它随着V〜(1/2)而减小,而随着正向偏压的增加而迅速增加。对于高密度的g-r中心,在反向偏置中,观察到与电压相关性的偏离,而在正向偏置中,出现负电容。这与实验相符。从这些结果中,我们对所涉及的过程有了物理上的理解。这些结果在辐射损坏的器件,寿命终止的二极管以及由高电阻和半绝缘材料制成的器件中有特定的应用,尤其是在解释C-V曲线以评估固定空间电荷密度时。

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