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A THz-range planar NDR device utilizing ballistic electron acceleration in GaN

机译:利用GaN中的弹道电子加速度的THz范围平面NDR器件

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摘要

A planar and ultra-short gallium nitride (GaN) diode structure is investigated as a potential Terahertz (THz) range negative differential resistance (NDR) diode. An empirical velocity-field relation, exhibiting a peak electron velocity as high as 7 x 107 cm/s, is employed to characterize the high-field transport in the simulations, accounting for ballistic electron acceleration and velocity reduction due to phonon build up. The resulting device operation is in accumulation-layer transit-time mode and large-signal circuit simulation results are reported along with discussions. Conversion efficiencies up to ~3.4% at ~1.5THz are shown to be possible.
机译:研究了平面和超短氮化镓(GaN)二极管结构,作为潜在的太赫兹(THz)范围负差分电阻(NDR)二极管。在模拟中,采用经验速度场关系,表现出高达7 x 107 cm / s的峰值电子速度,来表征高场输运,考虑了声子电子的加速和声子积累引起的速度降低。最终的器件工作在累积层传输时间模式下,并随讨论报告了大信号电路仿真结果。在〜1.5THz时,转换效率高达〜3.4%是可能的。

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