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首页> 外文期刊>Solid-State Electronics >Pt/ti/al_2O_3/al Tunnel Junctions Exhibiting Electroforming-Free Bipolar Resistive Switching Behavior
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Pt/ti/al_2O_3/al Tunnel Junctions Exhibiting Electroforming-Free Bipolar Resistive Switching Behavior

机译:Pt / ti / al_2O_3 / al隧道结具有无电铸双极电阻切换行为

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摘要

We investigated electroforming-free bipolar resistive switching behavior in Pt/Ti/AI_2O_3/Al tunnel junctions where the AI_2O_3 tunnel barrier was naturally formed on Al in air. Various compliance current values for the junction's set switching successfully lead to various resistance values in its low resistance state, suggesting the possibility for multi-level-operation. A mechanism for the bipolar switching is qualitatively discussed in terms of the modulation of the tunnel barrier by the reactive Ti layer on top of the barrier.
机译:我们研究了Pt / Ti / AI_2O_3 / Al隧道结中无电铸双极电阻切换行为,其中AI_2O_3隧道势垒自然形成于空气中的Al。结点设置开关的各种顺从电流值成功地导致了其低电阻状态下的各种电阻值,这暗示了多级操作的可能性。关于双极开关的机制,在势垒顶部的反应性Ti层对隧道势垒的调制方面进行了定性讨论。

著录项

  • 来源
    《Solid-State Electronics》 |2011年第1期|p.1-4|共4页
  • 作者单位

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawotgok-dong, Seongbuk-ku, Seoul 136-791, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawotgok-dong, Seongbuk-ku, Seoul 136-791, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Memory device; Resistive switching; RRAM;

    机译:存储设备;电阻切换;RRAM;

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