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Modeling of program, erase and retention characteristics of charge-trap gate all around memories

机译:围绕存储器的电荷陷阱门的编程,擦除和保留特性建模

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摘要

This paper describes the effect of geometry in charge-trap (CT) memory devices. We first theoretically analyze the impact of the curvature radius on the behavior of the gate current in Cate-All-Around devices, and then describe the change to make to planar model in order to fit the cylindrical devices characteristics. This model is used to simulate Nanocrystal and SONOS program, erase and retention behaviors. The dynamics enhancement during program/erase due to the bending of the active region in such cylindrical devices is explained. The scaling perspectives conclude this paper.
机译:本文介绍了电荷陷阱(CT)存储设备中几何形状的影响。我们首先从理论上分析曲率半径对Cate-All-Around器件中栅极电流行为的影响,然后描述为了适应圆柱形器件特性而对平面模型进行的更改。该模型用于模拟Nanocrystal和SONOS程序,擦除和保留行为。解释了在这种圆柱形装置中由于有源区域的弯曲而在编程/擦除期间的动态增强。伸缩观点总结了本文。

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