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Compact model for long-channel cylindrical surrounding-gate MOSFETs valid from low to high doping concentrations

机译:适用于低掺杂浓度到高掺杂浓度的长通道圆柱形环绕栅MOSFET的紧凑模型

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摘要

This paper presents a compact model for the electrostatic potentials and the current characteristics of doped long-channel cylindrical surrounding-gate (SRG) MOSFETs. An analytical expression of the potentials is derived as a function of doping concentration. Then, the mobile charge density is calculated using the analytical expressions of the surface potential at the surface and the difference of potentials between the surface and the center of the silicon doped layer. Using the expression obtained for the mobile charge, a drain current expression is derived. Comparisons of the modeled expressions with the simulated characteristics obtained from the 3D ATLAS device simulator for the transfer characteristics, as well for the output characteristics, show good agreement within the practical range of gate and drain voltages and for doping concentrations ranging from 10~(16) cm~(-3) to 5 × 10~(18) cm~(-3).
机译:本文为掺杂长沟道圆柱形环绕栅(SRG)MOSFET的静电势和电流特性提供了一个紧凑模型。电位的分析表达式是掺杂浓度的函数。然后,使用表面处的表面电势以及表面和硅掺杂层的中心之间的电势差的解析表达式来计算移动电荷密度。使用针对移动电荷获得的表达式,导出漏极电流表达式。从3D ATLAS器件仿真器获得的模拟特性与传输特性以及输出特性的模拟表达式的比较表明,在栅极和漏极电压的实际范围内以及掺杂浓度为10〜(16)范围内都具有良好的一致性厘米〜(-3)至5×10〜(18)厘米〜(-3)。

著录项

  • 来源
    《Solid-State Electronics》 |2011年第1期|p.13-18|共6页
  • 作者单位

    DEEEA, Universitat Rovira i Virgili (URV), Tarragona 43007, Spain;

    rnSEES,CINVESTAV-IPN. Mexico DF. Mexico;

    rnDEEEA, Universitat Rovira I Virgili (URV), Tarragona 43007, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    surrounding-gate (SRG) MOSFET; compact modeling;

    机译:环绕栅(SRG)MOSFET;紧凑造型;

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