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New shallow donor centres in high-purity Czochralski-grown silicon single crystals

机译:高纯度切克劳斯基生长的硅单晶的新浅供体中心

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摘要

Two new shallow donor centres NSD(i) and NSD(ii) with binding energies of 38.32 meV and 40.09 meV, respectively, were observed in n-type high-purity Czochralski-grown silicon single crystals by means of high-resolution photothermal ionization spectroscopy. Their spectral features and the temperature dependence of the intensity of their spectral lines imply that they are two new independent hydrogenic shallow donors. Low magnetic field investigations were performed to support our statement. The existence of the new donor centres seems to be related to the micro-defects in the sample.
机译:通过高分辨率光热电离光谱法在n型高纯度切克劳斯基生长的硅单晶中观察到两个新的浅供体中心NSD(i)和NSD(ii)的结合能分别为38.32 meV和40.09 meV。 。它们的光谱特征和光谱线强度的温度依赖性表明它们是两个新的独立的氢浅供体。进行了低磁场调查以支持我们的陈述。新的供体中心的存在似乎与样品中的微小缺陷有关。

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