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Fourier transform infrared spectroscopy and scanning tunneling spectroscopy of porous silicon in the presence of methanol

机译:甲醇存在下多孔硅的傅里叶变换红外光谱和扫描隧道光谱

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摘要

Porous silicon samples were obtained from p~+- and n-type silicon wafers. Gas sensing measurements showed that the electrical conductivity of porous Si on p~+- and n-type wafers increases strongly and decreases weakly in the presence of methanol gas, respectively. Scanning tunneling spectroscopy (STS) indicates that the adsorption of methanol on the surface of n-porous silicon decreases the average density of states especially in the band gap. Fourier transform infrared (FTIR) spectroscopy reveals that after methanol exposure partial surface oxidation occurs which produces electron traps as well as methanol adsorption on the porous surfaces. These observations imply that the number of free-carriers in p+-type (n-type) porous silicon increases (decreases) in methanol environment. These results explain the change in electrical conductivity of porous Si in the presence of methanol.
机译:多孔硅样品是从p〜+型和n型硅晶片上获得的。气敏测量表明,在存在甲醇气体的情况下,多孔硅在p〜+型晶片和n型晶片上的电导率分别强而弱地降低。扫描隧道光谱法(STS)表明,甲醇在n多孔硅表面的吸附会降低平均态密度,尤其是在带隙中。傅立叶变换红外(FTIR)光谱表明,甲醇暴露后,发生了部分表面氧化,这会在多孔表面上产生电子陷阱和甲醇吸附。这些观察结果暗示在甲醇环境下,p +型(n型)多孔硅中的自由载流子的数量增加(减少)。这些结果解释了在甲醇存在下多孔硅的电导率的变化。

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