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Determination of defect level parameters in semi-insulating GaAs : Cr from transient photocurrent experiment

机译:从瞬态光电流实验确定半绝缘GaAs:Cr中缺陷水平参数

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Transient photocurrent (TPC) measurements at several temperatures are used to determine the defect level parameters and the density of states distribution in semi-insulating Cr-doped GaAs. A two-dependent-step analysis is applied. Firstly, we determine the energy positions and the attempt-to-escape frequencies of the different defect levels from the Arrhenius plots of the corresponding emission times observed in the TPC decays. Secondly, we compute the density of states energy distribution g(E) from the same TPC decays using the Fourier transform technique with an exact matrix solution for g(E). The results obtained for this particular material are: four Gaussian bands, peaked around the energies 0.11, 0.21, 0.32 and 0.45 eV, with 10(17), 10(16), 5 x 10(15) and 10(15) cm(-3) eV(-1) as maximum values, respectively. This computed g (E) is introduced as a model of state distribution in an independent numerical simulation to reconstruct the experimental TPC data, and thus to validate the present analysis for g (E) determination. It is also found that the first TPC drop for times lower than 100 ns is dominated by the initial hole trapping. Full reconstruction requires then to take into account the hole current contribution in the TPC simulation at least at short times.
机译:在几个温度下的瞬态光电流(TPC)测量用于确定半绝缘Cr掺杂GaAs中的缺陷能级参数和状态分布的密度。应用了两步分析法。首先,我们从TPC衰变中观察到的相应发射时间的阿伦尼乌斯图中确定了不同缺陷水平的能量位置和逃逸频率。其次,我们使用傅立叶变换技术和g(E)的精确矩阵解,从相同的TPC衰变计算状态能量分布g(E)的密度。对于这种特定材料获得的结果是:四个高斯带,在能量0.11、0.21、0.32和0.45 eV附近达到峰值,具有10(17),10(16),5 x 10(15)和10(15)cm( -3)eV(-1)分别作为最大值。将此计算的g(E)作为状态分布模型引入独立的数值模拟中,以重建实验TPC数据,从而验证用于g(E)确定的当前分析。还发现,低于100 ns的时间的第一个TPC压降主要由初始空穴陷阱控制。完全重建则需要至少在短时间内考虑TPC模拟中的空穴电流贡献。

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