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Relaxation of electrical properties of n-type layers formed by ion milling in epitaxial HgCdTe doped with V-group acceptors

机译:在掺有V型受体的外延HgCdTe中通过离子铣削形成的n型层的电性能弛豫

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摘要

The relaxation of electrical properties of As- and Sb-doped HgCdTe epitaxial layers, which were converted into n-type by ion milling, is studied. It is shown that donor complexes formed under ion milling and responsible for p-to-n conductivity type conversion are not stable, and their concentration decreases upon storage even at room temperature. Increasing the temperature of the storage speeds up the relaxation process. It is demonstrated that the relaxation is caused by the disintegration of the donor complexes that starts right after the end of the milling process because of the decrease in the concentration of interstitial mercury atoms, which were generated during the milling. The results presented in the paper are important for the development of the technology of photodetectors based on HgCdTe doped with V-group acceptors.
机译:研究了掺杂As和Sb的HgCdTe外延层的电性能的弛豫现象,这些离子通过离子铣削转变为n型。结果表明,在离子铣削作用下形成的,可进行p-n型导电类型转换的供体配合物不稳定,即使在室温下储存,其浓度也会降低。升高存储温度可加快松弛过程。已经证明,松弛是由于在研磨过程结束后立即开始的供体配合物的分解引起的,这是由于在研磨过程中产生的间隙汞原子的浓度降低了。本文提出的结果对于基于掺有V-族受体的HgCdTe的光电探测器技术的发展具有重要意义。

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