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Simulation of the reverse Ⅰ-Ⅴ characteristics of the Schottky barrier radiation detector structures prepared on semi-insulating GaAs

机译:半绝缘GaAs制备的肖特基势垒辐射探测器结构Ⅰ-Ⅴ反向特性的仿真

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The reverse current-voltage (Ⅰ-Ⅴ) characteristics of the Schottky barrier radiation detector structures prepared on semi-insulating gallium arsenide (SI GaAs) have been simulated using a modified thermionic field emission (TFE) model. In order to explain the charge-current transport, the effect of tunnelling and thermionic field emission together with the Schottky barrier lowering were considered taking into account the voltage drop on the quasi-neutral bulk region. The modified TFE model describes reverse Ⅰ-Ⅴ characteristics in the temperature range between 300 K and 360 K. An observed agreement between measured and simulated characteristics enabled us to determine the Schottky barrier height and specific resistance of the SI GaAs base from the theoretical simulation. The results of calculated resistivities are compared with resistivities determined by the van der Pauw method. The value of the Schottky barrier height is in good agreement with the previously published data. A much higher value of the calculated ohmic current compared to the current corresponding to the diode structure at a low bias/current region is revealed. A detected difference increases with increasing temperature. This fact led us to conclude that the current in the linear part of the Ⅰ-Ⅴ characteristics in the low bias region does not correspond to the ohmic transport, being linear; that is, in contradiction with the more generally considered view.
机译:利用改进的热电子场发射(TFE)模型模拟​​了在半绝缘砷化镓(SI GaAs)上制备的肖特基势垒辐射探测器结构的反向电流-电压(Ⅰ-Ⅴ)特性。为了解释电荷电流传输,考虑了准中性本体区域上的电压降,考虑了隧穿和热电子场发射以及肖特基势垒降低的影响。改进的TFE模型描述了300 K至360 K温度范围内的反向Ⅰ-Ⅴ特性。实测和仿真特性之间的观察一致使我们能够从理论仿真确定SI GaAs基的肖特基势垒高度和电阻率。将计算出的电阻率的结果与通过van der Pauw方法确定的电阻率进行比较。肖特基势垒高度的值与先前发布的数据高度吻合。与在低偏置/电流区域的对应于二极管结构的电流相比,计算出的欧姆电流的值要高得多。检测到的差异随温度升高而增加。这个事实使我们得出结论,低偏置区域中Ⅰ-Ⅴ特性的线性部分中的电流与欧姆输运不对应,而是线性的。也就是说,与更普遍考虑的观点相矛盾。

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