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Fabrication And Theoretical Analysis Of Gan-based Vertical Light-emitting Diodes With Sio_2 Current Blocking Layer

机译:具有Sio_2电流阻挡层的Gan基垂直发光二极管的制备及理论分析

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摘要

We report the fabrication and characteristics of 1 x 1 mm~2 blue vertical light-emitting diodes (VLEDs) with a SiO_2 current blocking layer (CBL), together with their theoretical analysis in terms of electrical, optical and thermal properties. The SiO_2 CBL improves the total light extraction efficiency by relieving the current crowding under the metal n-electrode. Additionally, the total light extraction efficiency of LEDs with SiO_2 CBL remains almost the same independent of injection current, whereas that of conventional VLEDs is gradually decreased with injection current. The optical output power (Pout) for the VLED with SiO_2 CBL is increased by about 10% at 350 mA in a wafer level without serious degradation in operating voltage resulting from the insertion of SiO_2 CBL, thus resulting in a high P_(oul) of 670 mW at 950 mA. The simulated light-current-voltage characteristics of the fabricated devices were reasonably consistent with the measured results.
机译:我们报告了具有SiO_2电流阻挡层(CBL)的1 x 1 mm〜2蓝色垂直发光二极管(VLED)的制造和特性,以及它们在电,光学和热性能方面的理论分析。 SiO_2 CBL通过消除金属n电极下的电流拥挤来提高总光提取效率。另外,具有SiO_2CBL的LED的总光提取效率与注入电流无关,几乎保持不变,而常规VLED的总光提取效率随着注入电流而逐渐降低。具有SiO_2 CBL的VLED的光输出功率(Pout)在晶片级在350 mA下增加了约10%,而不会由于插入SiO_2 CBL而导致工作电压严重降低,从而导致较高的P_(oul)。 950 mA下为670 mW。所制造的器件的模拟光电流-电压特性与测量结果合理地一致。

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  • 来源
    《Semiconductor science and technology》 |2011年第9期|p.63-69|共7页
  • 作者单位

    Technology Development Department, Korea Advanced Nano Fab Center (KANC), 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do, Korea;

    Technology Development Department, Korea Advanced Nano Fab Center (KANC), 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do, Korea;

    Technology Development Department, Korea Advanced Nano Fab Center (KANC), 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do, Korea;

    Technology Development Department, Korea Advanced Nano Fab Center (KANC), 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do, Korea;

    Technology Development Department, Korea Advanced Nano Fab Center (KANC), 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do, Korea;

    Technology Development Department, Korea Advanced Nano Fab Center (KANC), 906-10 Iui-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do, Korea;

    Department of Electronics and Radio Engineering, Kyung Hee University, 1 Seocheon-dong, Giheung-gu, Yongin-si, Gyeonggi-do 446-701, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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