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首页> 外文期刊>Semiconductor science and technology >Photoelectric and deep level study of metamorphic InAs/InGaAs quantum dots with GaAs confining barriers for photoluminescence enhancement
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Photoelectric and deep level study of metamorphic InAs/InGaAs quantum dots with GaAs confining barriers for photoluminescence enhancement

机译:具有GaAs限制光致发光增强的GaAs Conumence屏障的光电和深层研究

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摘要

Metamorphic InAs/InGaAs quantum dots (QDs) have been proposed as active elements for optoelectronic light-emitting devices operating in the infrared range. However, advanced structure design to allow efficient and stable enhancement of quantum yield at room temperature are still needed. Here, we compare a metamorphic InAs/In0.15Ga0.85As QD heterostructure with and without GaAs confining barriers, to investigate the effect of introducing GaAs barriers on the photo- and thermo-electrical properties. GaAs confining barriers allow to enhance the QD photoluminescence intensity at 1.3 mu m, i.e. second telecommunication window, by more than two orders of magnitude at room temperature and at 80 K. We also discuss the effect of GaAs barriers on the carrier transport and on defect-related levels detected by means of photocurrent and deep level thermally stimulated current spectroscopies. GaAs confining barriers decrease the thermal escape rate of electrons confined in QD and wetting layer, thereby highly increasing the radiative recombination and also quenching the photocurrent. At low temperatures, the barriers also reduce the capture of electrons generated in InGaAs by the QD layer and, on the other hand, prevent the trapping of electrons outside the QD layer, decreasing carrier lifetimes. The deep levels identified as point and extended defects have been detected in the InGaAs layers. There are no new types of defects introduced in the structure by the addition of the barriers, but this causes a weakly increased density of traps near QDs. Our results show that InAs/InGaAs QDs with GaAs confining barriers can be efficient light emitters with only a slight increase of defects in the structure. Hence, such advanced design for metamorphic QDs can be of relevant interest for applications in energy-efficient QD lasers, optical amplifiers and single-photon emitters operating at 1.3-1.55 mu m.
机译:已经提出了变质Inas / InGaAs量子点(QDS)作为在红外范围内操作的光电发光器件的有源元件。然而,仍然需要先进的结构设计,以便在室温下允许高效和稳定增强量子产量。在这里,我们比较Metalmorphic Inas / In0.15Ga0.85as QD异质结构,而没有GaAs限制障碍,以研究引入GaAs屏障对光照和热性能的影响。 GaAs限制障碍允许增强1.3 mu m,即第二电信窗口的QD光致发光强度,在室温下超过两个数量级,并且在80 k下讨论了GaAs屏障对载体运输和缺陷的影响通过光电流和深层热刺激的电流光谱检测的相关水平。 GaAs限制屏障减小了QD和润湿层内限制的电子的热逃逸速率,从而高度增加辐射重组并淬灭光电流​​。在低温下,屏障还通过QD层减少InGaAs中产生的电子捕获,另一方面,防止QD层外部的电子捕获,减小载体寿命。在InGaAS层中检测到识别为点和延长缺陷的深度。通过添加屏障在结构中没有新类型的缺陷,但这导致QD附近的陷阱密度弱增加。我们的研究结果表明,具有GaAs限制障碍的InAs / InGaAs QD可以是高效的光发射器,只有略微增加结构的缺陷。因此,变质QD的这种先进的设计对于节能QD激光器,光放大器和单光子发射器的应用可以是相关的兴趣,在1.3-1.55 mu m下操作。

著录项

  • 来源
    《Semiconductor science and technology》 |2020年第9期|095022.1-095022.11|共11页
  • 作者单位

    Shenzhen Univ Coll Phys & Optoelect Engn Minist Educ & Guangdong Prov Key Lab Optoelect Devices & Syst Shenzhen 518060 Peoples R China|Natl Acad Sci Inst Semicond Phys UA-03680 Kiev Ukraine;

    Taras Shevchenko Natl Univ Kyiv Phys Dept UA-01601 Kiev Ukraine;

    IMEM CNR Inst Mat Elect & Magnetism I-43124 Parma Italy;

    Taras Shevchenko Natl Univ Kyiv Phys Dept UA-01601 Kiev Ukraine;

    IMEM CNR Inst Mat Elect & Magnetism I-43124 Parma Italy;

    IMEM CNR Inst Mat Elect & Magnetism I-43124 Parma Italy;

    Shenzhen Univ Coll Phys & Optoelect Engn Minist Educ & Guangdong Prov Key Lab Optoelect Devices & Syst Shenzhen 518060 Peoples R China;

    Shenzhen Univ Coll Phys & Optoelect Engn Minist Educ & Guangdong Prov Key Lab Optoelect Devices & Syst Shenzhen 518060 Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    nanostructure; quantum dot; InAs; InGaAs; photoluminescence; photocurrent; defect;

    机译:纳米结构;量子点;InAs;IngaAs;光致发光;光电流;缺陷;

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