Next-Generation Lithography Tools: The Choices Narrow

摘要

Eighteen months ago, International SEMATECH narrowed its choice of possible successors to optical lithography to four: extreme UV (EUV), ion projection lithography (IPL), SCALPEL and X-ray. Each has demonstrated printing capabilities to 70 nm or below. However, at the recommendation of the Next Generation Lithography (NGL) Task-force, funding now will be limited to EUV and SCALPEL. Timing appears to be the factor with 157 nm optical lithography intended to carry the industry through the 90 nm technology node, thus paving the way to an additional decade of development. But with ever-present uncertainties, can we afford to overlook any of the NGL techniques? Proponents of each tell why they continue to develop and promote their respective technologies.