ENHANCED IMPLANTATION AND DEPOSITION OF METAL IONS BY IMMERSION IN SYNCHRONOUS MODULATED RF - DRIVEN PLASMA

摘要

An improved ion source based on synchronous enhancement of RF-driven plasma by superimposed high voltage pulses is tested for metal ion implantation on non-metallic surfaces. The results were compared to metal ion implantation by immersion in classical RF plasma. It was demonstrated that using the improved ion source, the metal layer is more compact and less contaminated and a larger amount of implanted ions can be found in the non-metallic substrate.