Radio frequency ion source operated with field effect transistor based radio frequency system a

摘要

Characteristics of radio frequency (RF) plasma production are investigated using a field effect transistor inverter power supply as an RF wave source. With the frequency of around 0.3 MHz, an electron density over 1018 m−3 is produced in argon plasma. Although lower densities are obtained in hydrogen plasma, it drastically increased up to 5×1018 m−3 with an axial magnetic field of around 100 G applied in the driver region. Effects of the magnetic field and gas pressure are investigated in the RF produced plasma with the frequency of several hundred kilohertz. © 2010 American Institute of Physics Article Outline INTRODUCTION EXPERIMENTAL SETUP Vacuum chamber and an ion source MOSFET inverter type RF power supply RESULTS AND DISCUSSION SUMMARY