Research Disclosure

摘要

This research disclosure relates to removing contamination from one or more components. The one or more components may, for example, include a sensor or a mirror. The sensor may be arranged in the vicinity of a support for a substrate. The mirror may be arranged in the vicinity of a radiation source, in particular an extreme-ultraviolet (EUV) radiation source. The substrate support and/or radiation source may form part of a lithographic apparatus, in particular an EUV lithographic apparatus.