Considering the above, it is an object of the invention to provide a positioning system with an improved, i.e. reduced, actuator force transmissibility. According to an embodiment of the invention, there is provided a positioning system for moving or positioning a moveable object. According to another embodiment of the invention, there is provided a lithographic apparatus comprising a positioning system according to the invention. According to a further embodiment of the invention, there is provided a method for attenuating transmission of driving forces applied between a moveable object and a reaction mass of a dynamic support system by configuring the dynamic support system as a multiple-spring-mass-damper system having a first eigenfrequency and a second eigenfrequency in a direction that are substantially the same. According to yet another embodiment of the invention, there is provided a device manufacturing method wherein use is made of a lithographic apparatus according to the invention.
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