Research Disclosure

摘要

This research disclosure relates to a vibration damping system for a lithographic apparatus. The lithographic apparatus may be used in a lithographic system, for example, in an extreme ultraviolet (EUV) lithographic system or a deep ultraviolet (DUV) lithographic system. The lithographic system may comprise a radiation source and a lithographic apparatus. The radiation source produces a radiation beam that enters the lithographic apparatus. The radiation may be EUV or DUV. Within the lithographic apparatus, there are a plurality of optics. The radiation beam is directed to a reticle, which is supported by a reticle stage, by beam shaping optics that control the spatial and angular distribution of the radiation incident on the reticle. The reticle is configured to pattern the radiation beam to form a patterned radiation beam. The resultant patterned radiation beam is received by projection optics that is arranged to form a diffraction-limited image of the reticle on a wafer, the wafer being supported by a wafer stage. The optics may be reflective (for example mirrors) and/or transmissive (for example lenses). Similarly, the reticle may be reflective or of the form of a transmissive mask.