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Reagent purity in relation to MDI/PMDI manufacture

机译:试剂纯度与MDI / PMDI制造有关

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The stepwise conversion of benzene to MDI/PMDI, via nitrobenzene, aniline and MDA/PMDA intermediates is well-known and operated commercially at very large scale. Extensive patent and other literature in the public domain teaches many aspects of the relevant technology. Still further improvements in the industrial plants can be achieved by, amongst other things, recognizing and mitigating against the important effects of relatively minor amounts of impurities in the reagents, catalysts and other chemicals used at each of the production stages. It is to be understood of course that the scientific and technical aspects (causes and effects) may be well known but that the level or impact of such effects may change with time such that new problems can occur or be defined where the solutions are merely extensions of existing knowledge. This is also true for new impurities generated within the production processes themselves. Thus, for example, trace metal impurities in the nitric or sulfuric acids used in nitrobenzene production can have deleterious effects on the operation of that process, as can trace metals in the hydrochloric acid or formalin used in the MDA process. So-called "N-methyl" groups (>N-CH_3 functional groups), formed in MDA/PMDA by locally high concentrations of formaldehyde-type groups, lead to chlorinated impurities in MDI/PMDI and subsequently derived products and can be reduced in amount by production control (reaction temperature, formalin addition rate, reagent mixing energy).
机译:通过硝基苯,苯胺和MDA / PMDA中间体逐步转化为MDI / PMDI,通过硝基苯,苯胺和MDA / PMDA中间体是众所周知的并且在非常大的规模上商购和操作。公共领域的广泛专利和其他文献教导了相关技术的许多方面。工业厂的进一步改善可以通过其他事物,识别和减轻在每个生产阶段中使用的试剂,催化剂和其他化学品中相对少量的杂质的重要效果来实现。应理解,科学和技术方面(原因和效应)可能是众所周知的,但这种效果的水平或影响可能随时间变化,使得可以发生或被定义解决方案仅限于延长的新问题现有知识。这对于生产过程本身产生的新杂质也是如此。因此,例如,在硝基苯生产中使用的硝酸或硫酸中的痕量金属杂质可以对该方法的操作具有有害影响,因为MDA工艺中使用的盐酸或福尔马林中的含量可以追踪金属。通过局部高浓度的甲醛型基团在MDA / PMDA中形成的所谓的“N-甲基”基团(> N-CH_3官能团),导致MDI / PMDI和随后衍生的产物中的氯化杂质,可以减少通过生产控制量(反应温度,福尔马林添加率,试剂混合能量)。

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    《Research Disclosure》 |2021年第682期|705-705|共1页
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