APPARATUS AND METHOD FOR CLEANING AN INSPECTION SYSTEM

摘要

A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., mirrors of a VUV) of a wafer inspection system is disclosed. The cleaning system ionizes or disassociates the hydrogen gas in VUV optics environment to generate hydrogen radicals (e.g.. H') or ions (e.g., H~+. H_2~+, H_3~+). which remove water or hydrocarbons from the surface nf the mirrors. The VUV mirrors may comprise a reflective material, such as aluminum. The VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may comprise a noble metal.