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Research Disclosure

机译:研究披露

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In lithography syslems, for example extreme ultraviolet (EUV) lithography systems or deep ultraviolet (DUV) lithography systems, sensors such as wafer stage sensors may be used for lens setup, reticle alignment, wafer stage alignment, and lot correction.These sensors may comprise an upper housing and a lower housing.These two housing parts may he glued together in a radial way (see Figure 1 left).That is, one of the Iwo housing parts may overlap with the side wall of the other housing part.In an embodiment, instead of glue, the two housing parts may be attached in other ways, like soldering, laser welding etc.Curing and outgassing of the glue between the two housing parts may lead to a shrink of the glue, which may lead to deformation of the housing parts.If one of the housing parts is attached to a sensor element (for example, the sensor element may be on top of the upper housing), the deformation of the housing part may lead to a deformation of the sensor element and thus harming the performance of the sensor element.
机译:在光刻系统中,例如极端紫外线(EUV)光刻系统或深紫外(DUV)光刻系统,诸如晶片级传感器的传感器可用于镜头设置,掩模版对准,晶片级对准和批量校正。这些传感器可包括上壳和下部外壳。这些壳体部件可以以径向方式粘在一起(见图1左)。这是,IWO壳体部件中的一个可以与另一个壳体部分的侧壁重叠。在实施例代替胶水,两个壳体部件可以以其他方式附接,例如焊接,激光焊接等两个壳体部件之间的胶水可以导致胶水的收缩,这可能导致变形壳体部分。如果壳体部分的一个连接到传感器元件(例如,传感器元件可以位于上壳体的顶部),壳体部分的变形可能导致传感器元件的变形,从而导致传感器元件的变形伤害这一点传感器元件的性能。

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    《Research Disclosure》 |2020年第669期|84-84|共1页
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