Research disclosure

摘要

A lithographic apparatus is an apparatus which uses light or radiation to expose structures/patterns into a photoresist on a water. The lithographic apparatus typically comprises three elements, the illuminator, the wafer stage and the projection optics. The lithographic apparatus may he an Extreme Ultraviolet (EUV) lithographic apparatus. Optical components and sensors in the lithographic apparatus may become contaminated over time. This contamination affects the performance of the optical components and the sensors. The contamination may comprise carbon contamination.