METHODS FOR DETERMINING SCANNING ELECTRON MICROSCOPE (SEM) SCAN ANGLE FROM A MEASURED IMAGE

摘要

A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). Driven by the growing demand of manufacturing modern integrated circuits with ever shrinking sizes, lithographic technologies that can offer higher resolution and better reliability arc under a fast-paced and extensive development. One of such advancing lithographic technologies is the extreme ultra-violet lithography (also known as EUV or EUVL), which allows for sub-10 nanometre (nni) scale resolution. In lithographic processes, it is desirable frequently to make measurements of the structures created, e.g., for process control and verification. In order to keep pace with the advancement of lithographic technologies, various inspection and metrology tools have been made available. One of such inspection and metrology tools is based on scanning electron microscopy.