Localised Cleaning & Particle Removal of EUV Pellicle using Focused Acoustic Waves

摘要

Pellicles are used in lithography to prevent contamination of the photomask. However, pellicles for use in extreme ultraviolent (EUV) lithography face operational demands that conventional pellicles do not, such as required thinness and withstanding higher wattages. Pellicles for use in EUV systems are therefore subject to a different manufacturing procedure.