Semiconductor Proeessina Equioment

摘要

This research disclosure relates to a system and method of determining the amount of liquid fuel present in a fuel chamber. The liquid fuel may be a metal, e.g. tin. The fuel chamber may be held at elevated pressures (e.g. about 4000 pounds per square inch) and/or elevated temperatures (e.g. at or above the me lting point of tin). The fuel chamber may form part of a rad iation source. The radiation source may be configured to generate extreme ultra-violet (EUV) radiation. The radiation source may be configured to provide EUV radiation to a lithographic apparatus (i.e. an EUV lithographic apparatus).